Patents by Inventor Jacob W. Lin

Jacob W. Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6716779
    Abstract: A silicate based composition for optical glass used as a substrate for thin film optical interference filters having a stable transmission band center wavelength and bandwidth has a relatively high coefficient of thermal expansion, high Young's modulus and high optical transmittance in the near infrared (NIR) wavelength range of about 950 nm to about 1600 nm. The coefficient of thermal expansion of the glass composition is adjustable to particular values to result in minimal wavelength shift in filters made by depositing thin films of particular dielectric materials onto a substrate made of the glass, the composition being varied from a preferred baseline composition consisting of about 43.2% SiO2, 7% Al2O3, 12.7% CaO, 7.3% SrO, 7.8% Li2O, 13.2% Na2O, 8.0% K2O, 0.7% ZrO, and 0.1% Sb2O3, the baseline composition having a coefficient of thermal expansion of about 112×10−7/° C. over the temperature range of −30° C. to +70° C., a Young's modulus E of 88.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: April 6, 2004
    Assignees: OptoElectronics International, Inc.
    Inventor: Jacob W. Lin
  • Publication number: 20030147016
    Abstract: The invention has modified the conventional LCD structure, wherein a polarizing film is directly coated in the liquid crystal cell instead of the conventional polarizing plate, which is glued on the outer side of the liquid crystal cell. Then, the invention can prevent the direct contact between the polarizing film and the touch panel of film film (FF) type or in film plastic (FP) type. Thus, the touch panel on the LCD panel can adapt various technologies, so that the touch panel of FF type can be used without worrying about the damage on the polarizing film due to the pressure while a point touch is applied on the touch panel. Also and, for the touch panel of FP type, a conductive film can be directly coated on the panel substrate. The invention uses the coating polarizing film as an extraordinary mode (e-mode) polarizer. Also and, an ordinary mode (o-mode) polarizer can also be adapted, so as to expand the large viewing angle in good polarizing effect.
    Type: Application
    Filed: December 9, 2002
    Publication date: August 7, 2003
    Inventors: Jacob W. Lin, Chiafu Jeff Nien, Ching-Sheng Cho, Szu-Hsien Chen, Wen-Chi Huang
  • Publication number: 20030050173
    Abstract: A silicate based composition for optical glass used as a substrate for thin film optical interference filters having a stable transmission band center wavelength and bandwidth has a relatively high coefficient of thermal expansion, high Young's modulus and high optical transmittance in the near infrared (NIR) wavelength range of about 950 nm to about 1600 nm. The coefficient of thermal expansion of the glass composition is adjustable to particular values to result in minimal wavelength shift in filters made by depositing thin films of particular dielectric materials onto a substrate made of the glass, the composition being varied from a preferred baseline composition consisting of about 43.2% SiO2, 7% Al2O3, 12.7% CaO, 7.3% SrO, 7.8% Li2O, 13.2% Na2O, 8.0% K2O, 0.7% ZrO, and 0.1% Sb2O3, the baseline composition having a coefficient of thermal expansion of about 112×10−7/° C. over the temperature range of −30° C. to +70° C., a Young's modulus E of 88.
    Type: Application
    Filed: August 14, 2001
    Publication date: March 13, 2003
    Inventor: Jacob W. Lin
  • Patent number: 4374179
    Abstract: A plasma polymerized ethane thin film deposited on a variety of substrates has been discovered to be an improved interlayer dielectric. It is a material having property of high dielectric strength and unique low dielectric constant. It also has advantages of depositing pinhole free, crack resistant with good step coverage and low deposition cost.
    Type: Grant
    Filed: December 18, 1980
    Date of Patent: February 15, 1983
    Assignee: Honeywell Inc.
    Inventors: Jacob W. Lin, Leslie S. Weinman
  • Patent number: 4358519
    Abstract: This invention pertains to an improved technique of introducing an added insulative layer between the thermoplastic layer and the photoconductive layer of the thermoplastic photoconductive holographic recording medium. The added layer (pure PVK) is electrically insulating at temperatures used for thermal development to prevent decaying charge contrast during hologram development.
    Type: Grant
    Filed: December 5, 1977
    Date of Patent: November 9, 1982
    Assignee: Honeywell Inc.
    Inventors: Kuo H. Chang, Tzuo-Chang Lee, Jacob W. Lin
  • Patent number: 4282295
    Abstract: In a thermoplastic-photoconductor holographic recording medium in the form of several transparent layers over a transparent substrate, such as an optically transparent electrically conductive layer, then a photoconductor layer and a thermoplastic layer over such as glass or Mylar, a conventional material such as gold or platinum has been used as a transparent conductive layer. It is desired to use a less precious metal such as nickel-chromium (NiCr) as the conductive layer, however a limitation has been found in that an unwanted dark charge injection occurs from the NiCr to the photoconductive layer. This causes poor charge acceptance and therefore results in poor halogram formation. Herein a mono atom thick layer of the NiCr is treated and becomes on oxide layer which forms an effective charge blocking layer to dark charge injection.
    Type: Grant
    Filed: August 6, 1979
    Date of Patent: August 4, 1981
    Assignee: Honeywell Inc.
    Inventors: Tzuo-Chang Lee, Jacob W. Lin
  • Patent number: 4131462
    Abstract: This invention pertains to an improved thermoplastic holographic recording medium having an added layer between the thermoplastic layer and the photoconductor layer. The added layer is electrically insulating at temperatures used for thermal development to prevent decaying charge contrast during hologram development.
    Type: Grant
    Filed: February 17, 1976
    Date of Patent: December 26, 1978
    Assignee: Honeywell Inc.
    Inventors: Tzuo-Chang Lee, Jacob W. Lin