Patents by Inventor Jacobus Johannus Leonardus Hendricus Verspay

Jacobus Johannus Leonardus Hendricus Verspay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FLUID FILTRATION METHOD, FLUID FILTERED THEREBY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACUTRING METHOD
    Publication number: 20110136064
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Application
    Filed: February 17, 2011
    Publication date: June 9, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110122376
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Application
    Filed: June 8, 2010
    Publication date: May 26, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Patent number: 7932999
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: April 26, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
    Patent number: 7914687
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: March 29, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100321650
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Application
    Filed: August 26, 2010
    Publication date: December 23, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100315610
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Application
    Filed: June 22, 2010
    Publication date: December 16, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everadus Marie Hannen
  • Lithographic apparatus and device manufacturing method having liquid evaporation control
    Patent number: 7804575
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
    Type: Grant
    Filed: August 17, 2005
    Date of Patent: September 28, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7764356
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: July 27, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100177292
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: March 17, 2010
    Publication date: July 15, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans Jansen, Marco Koert Stavenga
  • Lithographic apparatus and device manufacturing method
    Patent number: 7710537
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: May 4, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Immersion Liquid, Exposure Apparatus, and Exposure Process
    Publication number: 20090134488
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Application
    Filed: February 6, 2006
    Publication date: May 28, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090033891
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Application
    Filed: September 26, 2008
    Publication date: February 5, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Johannes Hultermans, Ton DE Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080291407
    Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
    Type: Application
    Filed: May 14, 2008
    Publication date: November 27, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • Lithographic apparatus and device manufacturing method
    Patent number: 7446850
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Grant
    Filed: December 3, 2004
    Date of Patent: November 4, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080259292
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: April 2, 2008
    Publication date: October 23, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080259294
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Application
    Filed: June 19, 2008
    Publication date: October 23, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Lithographic apparatus and device manufacturing method
    Patent number: 7423720
    Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
  • Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
    Publication number: 20080187874
    Abstract: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
    Type: Application
    Filed: April 7, 2008
    Publication date: August 7, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederik De Graaf, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • Lithographic apparatus and device manufacturing method
    Patent number: 7397533
    Abstract: A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: July 8, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay
  • Lithographic apparatus and device manufacturing method
    Patent number: 7379155
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: May 27, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johaannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel