Abstract: A method and a device for writing data marks to an optical disc or a master disc are disclosed, the data marks to be arranged along at least one metatrack, which is formed by a number of coplanar parallel sub-tracks. The method comprises a step of superposing a rotational motion and a radial motion of the disc and of a writing beam spot on the disc relative to each other. The radial motion comprises a motion component in a first radial direction and periodically repeated jumps in a second radial direction opposite to the first radial direction. The radial motion is a superposition of a) a first radial motion component (18), by which the radial position of the writing beam spot as a function of the angular position with respect to the rotational motion is changed steadily with a first slope, and b) a periodic second radial motion component (20), one period of which, plotted as a function of said angular position, is divided into aa) a first interval (20.

Abstract: The invention relates to a record carrier comprising a train of marks and lands (14, 15, 23), which has a plurality of marks comprising shortest marks (1) and other marks (2) and a plurality of lands between said marks in a direction of said train of marks and lands comprising shortest lands (28) and other lands (27), said train of marks and lands (14, 15, 23) having information read by applying a light beam, and a land area not being part of said train of marks and lands.

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

Abstract: A photolithographic process is described. It comprises the steps of: applying a photoresist layer (2) on a substrate (1), locally exposing the photoresist layer (2) to a radiation source with a suitable wavelength, providing a suitable liquid developer composition on the substrate (1), dissolving an exposed or unexposed region of the photoresist layer (2) with the developer composition, rinsing and drying the photoresist layer (2) thereby interrupting said dissolving step. The substrate (1) has a metallic surface (1c) in contact with the photoresist layer (2) and the photoresist layer (2) has a thickness dr<100 nm. A relatively high photoresist wall steepness is achieved of 70 degrees or more. The process may be used for the production of high density optical data storage media by using a stamper (3) produced with said process.

Abstract: A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.

Abstract: An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

Abstract: In a method of measuring, in a lithographic manufacturing process using a lithographic projeciton apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a substrate, use is made of an alignment-measuring device forming part of the apparatus and of specific overlay marks in the substrate and resist layer. These marks have periodic structures with periods which cannot be resolved by the alignment device, but generate an interfernece pattern having a period corresponding to the period of a reference mark of the alignment device.

Abstract: For determing the alignment of a substrate with respect to a mask, a substrate alignment mark, having a periodic structure, and an additional alignment mark, having a periodic structure and provided in a resist layer (RL) on top of the substrate, are used. Upon illumination of these two marks, having a period which is considerably smaller than that of a reference amrk, an interference pattern (Pb) is generated, which has a period corresponding to that of the reference mark. By measuring the movement of the interfernece pattern with respect to the reference mark, the much smaller mutual movement of the fine alignment marks can be measured. In this way, the resolution and accuracy of a convenitonal alignment device can be increased considerably.

Abstract: An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.