Abstract: A display device prevents cracks from spreading to an active area. The display device includes a substrate including an active area and a non-active area having a bending area, a thin-film transistor disposed in the active area, a light-emitting element disposed in the active area and connected to the thin-film transistor, an encapsulation layer disposed on the light-emitting element, a touch sensor disposed on the encapsulation layer, a touch pad disposed in the non-active area, a first routing line connecting the touch sensor to the touch pad via a second routing line in the bending area, and a crack prevention layer disposed on the second routing line in the bending area. Thus, the crack prevention layer is capable of preventing the occurrence of cracks in the bending area BA, thus preventing cracks from spreading to the active area AA.

Abstract: A substrate processing apparatus includes: a processing chamber including a plasma generating region, a gas mixing region, and a substrate processing region; a first gas supply line supplying a first processing gas to the plasma generating region; a second gas supply line supplying a second processing gas to the gas mixing region; an ion blocker disposed between the plasma generating region and the gas mixing region; and a shower head disposed between the gas mixing region and the substrate processing region, wherein the ion blocker has a first blocker flow path unit connected to the second gas supply line and open to the plasma generating region, so that the second processing gas is supplied to the plasma generating region.

Abstract: A substrate processing apparatus and method for increasing substrate processing efficiency are provided. The substrate processing apparatus comprises a process chamber, in which a reaction gas is processed to have a first pressure therein, a first pumping module for pumping the process chamber to have a second pressure smaller than the first pressure, a second pumping module for pumping the process chamber to have a third pressure smaller than the second pressure, and a first automatic pressure control module for adjusting a magnitude of the second pressure by adjusting a pumping pressure of the first pumping module.

Abstract: Provided are a substrate processing apparatus and method for increasing the uniformity of substrate processing.

Abstract: A substrate processing apparatus including a substrate support unit connected to a vacuum pump to fix a substrate is provided. The substrate processing apparatus comprises a chamber including a processing space therein, a substrate support unit disposed in the processing space and for supporting a substrate, a first vacuum pump, a second vacuum pump connected to the processing space of the chamber, a first valve disposed between the first vacuum pump and the second vacuum pump, and a second valve disposed between the first vacuum pump and the substrate support unit, wherein the first vacuum pump reduces a pressure in a space between the substrate support unit and the substrate to fix the substrate to the substrate support unit in response to the second valve being turned on.

Abstract: A substrate treating apparatus configuring an individual LL for each PM and a semiconductor manufacturing facility including the same are provided. The semiconductor manufacturing facility comprises an index module including a first transfer robot and for carrying out and transferring a substrate mounted on a container using the first transfer robot, a transfer module including a second transfer robot and for relaying the substrate transferred by the index module using the second transfer robot, a buffer chamber for heating the substrate relayed by the transfer module, and a process chamber for treating the substrate heated by the buffer chamber, wherein the buffer chamber heats the substrate while the substrate waits before being loaded into the process chamber.

Abstract: Provided is an apparatus and method for obtaining depth information using an optical pattern. The apparatus for obtaining depth information using the optical pattern may include: a pattern projector to generate the optical pattern using a light source and an optical pattern projection element (OPPE), and to project the optical pattern towards an object area, the OPPE comprising a pattern that includes a plurality of pattern descriptors; an image obtaining unit to obtain an input image by photographing the object area; and a depth information obtaining unit to measure a change in a position of at least one of the plurality of pattern descriptors in the input image, and to obtain depth information of the input image based on the change in the position.

Abstract: Provided is an apparatus and method for obtaining depth information using an optical pattern. The apparatus for obtaining depth information using the optical pattern may include: a pattern projector to generate the optical pattern using a light source and an optical pattern projection element (OPPE), and to project the optical pattern towards an object area, the OPPE comprising a pattern that includes a plurality of pattern descriptors; an image obtaining unit to obtain an input image by photographing the object area; and a depth information obtaining unit to measure a change in a position of at least one of the plurality of pattern descriptors in the input image, and to obtain depth information of the input image based on the change in the position.