Patents by Inventor Jae Sik Na

Jae Sik Na has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240155829
    Abstract: A semiconductor memory device may include a plurality of bit lines extending in a first direction on a substrate, a plurality of active pillars respectively on the bit lines, a word line extending in a second direction along the plurality of active pillars, a plurality of landing pads respectively on the plurality of active pillars, and a plurality of data storage patterns respectively on the plurality of landing pads. Each of the plurality of active pillars may have a length extending in a direction perpendicular to an upper surface of the substrate. The word line has a wavy shape when viewed in a plan view.
    Type: Application
    Filed: June 22, 2023
    Publication date: May 9, 2024
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Changsik KIM, Jae Won NA, Junhwa SONG, Dong-Sik PARK
  • Publication number: 20240114674
    Abstract: A semiconductor memory device includes a substrate; a bit-line on the substrate and extending in a first direction; first and second channel patterns on the bit-line; the second channel pattern being spaced apart from the first channel pattern in the first direction; a first word-line between the first and second channel patterns and extending in a second direction that intersects the first direction; a second word-line between the first and second channel patterns, extending in the second direction, and being spaced apart from the first word-line in the first direction; capacitors on and connected to the channel patterns; wherein the first and second channel patterns include first and second metal oxide patterns sequentially on the bit-line, each of the first and second metal oxide patterns include an amorphous metal oxide, and a composition of the first metal oxide pattern is different from a composition of the second metal oxide pattern.
    Type: Application
    Filed: June 21, 2023
    Publication date: April 4, 2024
    Inventors: Jae Won NA, Chang Sik KIM, Jun Hwa SONG, Ji Hee JUN
  • Patent number: 5922104
    Abstract: This invention provides a polyamide separation membrane, prepared from high molecular weight polyamide having a repeating unit represented by the formula (I) and a process for separating gaseous mixtures using them. ##STR1## wherein, R is an aliphatic or aromatic organic group derived from dicarboxylic acid or halide. The polyamide separation membrane according to the present invention has a large free volume and good permeation properties such as permeability and permeation selectivity.
    Type: Grant
    Filed: November 10, 1997
    Date of Patent: July 13, 1999
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyun Chae Park, Jae Sik Na, Yong Soo Kang, Chul Joo Lee