Abstract: An electronic device is provided. The electronic device includes a main frame, an opening portion formed in the main frame, a recess portion formed along a frame of the opening portion lower than a surface of the main frame, and a plate having frames seated on the recess portion, wherein at least one of the frames of the plate is formed of a curved portion that is curved inwardly. Accordingly, it is possible to absorb an external impact and prevent deformation just by a simple structure change of the plate.

Abstract: A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed.

Abstract: A dishwasher that enables a user to adjust a load of a spring depending on material and weight of a cover that is attached to a door of the dishwasher. The dishwasher includes a housing having a bottom, a rear, and side covers, a door rotatably installed on a front surface of the housing, a door hinge installed onto each lower end of the door while being rotatably coupled to the housing, a spring configured to adjust a rotation of the door, and an apparatus of adjusting the spring configured to adjust a load of the spring. The apparatus includes a movable bracket connected to the spring, an adjustment member which enables the movable bracket to move up and down, and a support bracket configured to support the adjustment member. A position verification hole is perforated through the housing such that the apparatus is checked from outside the housing.

Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.

Abstract: The present invention relates to a method for the fast formation of a gas hydrate. More specifically, the present invention relates to a method for the formation of a fed-batch-type gas hydrate, the method including a first step i) of injecting a fresh aqueous solution containing a potential feed hydrate into a reactor, a second step ii) of feeding gas into the reactor in which the fresh aqueous solution containing the potential feed hydrate is injected in the first step, so as to pressurize said gas, and a third step iii) of injecting a surfactant solution into the reactor in which the gas is pressurized in the second step, as well as to a method for the formation of a batch-type gas hydrate, in which the first step is switched in sequence with the third step.

Abstract: Disclosed are a method and an apparatus for producing biodiesel from water-containing sewage sludge, using xylene or toluene, higher in boiling point than water, as a cosolvent.

Abstract: An electronic device may includes a housing including a portion that is transitionable between a pop-up state and a non-pop-up state, a locker for holding the portion of the housing in the non-pop-up state, and a pop-up device for popping up the portion of the housing when the locker releases the portion of the housing such that transitioning between the pop-up and non-pop-up states is allowed.

Abstract: A stereopsis image display device is provided that prevents 3D crosstalk from being generated and enables a lenticular film to be freely bent. The stereopsis image display device comprises a plurality of data lines arranged in a first direction; a plurality of gate lines arranged in a second direction; a plurality of sub pixels defined by crossing between the plurality of gate lines and the plurality of data lines; and a lenticular film provided on the plurality of sub pixels, wherein the plurality of sub pixels are provided in a horizontal 2-domain structure.

Abstract: A washing machine includes a power transmission apparatus and a power control apparatus. The power transmission apparatus includes a driving unit, a gear mechanism including an input shaft connected to the driving unit, a reduction assembly coupled to the input shaft to reduce its rotational speed to a preset gear ratio, a washing shaft coupled to the reduction assembly that rotates at the gear ratio, and a water removal assembly selectively connected to the driving unit in a water removal mode for independently rotating from the washing shaft, a coupling unit selectively transmitting a power of the driving unit to the water removal assembly in the water removal mode, and a brake unit selectively forcing the water removal assembly to stop in the water removal mode.

Abstract: A method for fabricating an acoustic sensor according to an exemplary embodiment of the present disclosure includes: forming an acoustic sensor unit by forming a lower electrode on an upper portion of a substrate, forming etching holes on the lower electrode, forming a sacrifice layer on an upper portion of the lower electrode, and coupling a diaphragm to an upper portion of the sacrifice layer; coupling a lower portion of the substrate of the acoustic sensor unit to a printed circuit board on which a sound pressure input hole is formed so as to expose the lower portion of the substrate of the acoustic sensor unit to the outside through the sound pressure input hole; attaching a cover covering the acoustic sensor unit on the printed circuit board; etching the substrate of the acoustic sensor unit to form an acoustic chamber; and removing the sacrifice layer.

Abstract: A link lever configured to assist operation of a clutch assembly is disclosed. In particular, a link lever configured to assist operation of a clutch assembly in a washing machine and that applies force to securely engage and completely release a coupling of the clutch assembly when the coupling is moved by a clutch lever between different sets of teeth in the clutch assembly.

Abstract: Disclosed is a washing machine including an air storage unit. configured to store air therein; a compression unit configured to communicate with the air storage unit and the outer tub, and to compress the air in the air storage unit by compressing water from an outer tub of the washing machine; and a water spraying tube connected to the compression unit and the tub cover. Further, the washing machine includes an opening and closing unit configured to open and close a flow path of the water spraying tube, wherein the opening and closing unit is configured to cause the water to be sprayed into an inner tub using compressed air from the air storage unit.

Abstract: A method of manufacturing a press mold for mass-producing a hot stamping cold trim includes bonding first and second steel bodies made of different materials to form a single body mold material, polishing a bottom surface and one edge surface of the mold material with processing margins, processing edge surfaces other than the one edge surface on which a bonding part is positioned, processing reference holes for guide pins and a reference surface, forming bolt holes penetrating through the reference surface and the bottom surface, processing a surface of the first steel body in a predetermined shape, heat-treating the mold material, and polishing the bottom surface and the one edge surface having the processing margins at desired accurate dimensions and wire-processing the one edge surface with the processing margin to configure a front end part having the desired accurate dimension.

Abstract: An image reproduction apparatus including a power control unit detecting whether an error has occurred in supplying power to the image reproduction apparatus; and a booting control unit selectively cold-booting the image reproduction apparatus based on the detection of whether the error with supplying the power has occurred.

Abstract: A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed.

Abstract: Provided herein is a method for forming fine patterns of semiconductor devices capable of forming patterns with 20 nm-level line width without bulk-exposure and hardening of guide patterns. Method steps include (a) forming a photoresist layer over a wafer on which an organic anti-reflection coating layer is formed; (b) exposing and developing the photoresist layer to form guide patterns; (c) forming a neutral layer over the wafer; (d) developing the guide patterns to remove them and form neutral layer patterns having an opening part; (e) coating block copolymer of directed self assembly material on the substrate and heating the substrate over a glass transition temperature (Tg) to form directed self-assembly patterns; and (f) selectively etching a part having relatively small etching resistivity (or high etching rate) among the directed self-assembly patterns by using O2 plasma to form fine patterns.

Abstract: A webshell detection and response system is provided. The webshell detection and response system may collect information from a detection target server through an information collection script inserted into a webpage home path of the detection target server without installing a separate web shell detection application compiled in the form of binary file in the detection target server, and determine whether the detection target server is infected with a webshell remotely using the collected information.

Abstract: An I-line photoresist composition, having excellent thermal stability at high temperature of 200-250° C., by which fine photoresist patterns form using an acid diffusion layer and a method for forming a fine pattern using the same, comprising: a polymer containing 1-99 mol % of repeating unit selected from a group consisting of 1-99 mol % of repeating unit represented by Formula 1, repeating unit represented by Formula 2, repeating unit represented by Formula 3 and mixture thereof; a photo active compound containing at least two diazonaphtoquinone (DNQ) groups; and an organic solvent. Formulas 1-3 are located in the specification. R* and R** are independently a hydrogen atom or a methyl group. R1 is a hydrogen atom or linear, branch or cyclic hydrocarbonyl group of 3-15 carbon atoms, containing or not containing 1-4 oxygen atoms. R2 is linear, branch or cyclic hydrocarbonyl group of 1-30 carbon atoms, containing or not containing 1-4 oxygen atoms.