Patents by Inventor Jaihyoung Lee

Jaihyoung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Si-polymers and photoresists comprising same
    Patent number: 8026037
    Abstract: New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: September 27, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Tao Zhang, Jaihyoung Lee
  • Si-polymers and photoresists comprising same
    Publication number: 20090136867
    Abstract: New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Application
    Filed: June 20, 2008
    Publication date: May 28, 2009
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Tao Zhang, Jaihyoung Lee
  • Polymers and photoresists comprising same
    Patent number: 7390609
    Abstract: New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: June 24, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Tao Zhang, Jaihyoung Lee
  • Polymers and photoresists comprising same
    Publication number: 20040248032
    Abstract: New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Application
    Filed: March 3, 2004
    Publication date: December 9, 2004
    Inventors: Anthony Zampini, Tao Zhang, Jaihyoung Lee