Patents by Inventor Jameel Ibrahim

Jameel Ibrahim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4952425
    Abstract: Particles of silicon and a p or n carrier substance which are in spherical or spheroidal form, and suitable for use in the preparation of doped semiconductor devices, can be prepared by a fluidized bed technique for chemical vapor deposition of a carrier substance (B, P, As or Sb). The prepared products have a kernel of high purity polysilicon and a layer of silicon/dopant alloy upon the kernel. Optionally, the particles have a thin outer layer of silicon.
    Type: Grant
    Filed: June 27, 1988
    Date of Patent: August 28, 1990
    Assignee: Ethyl Corporation
    Inventors: Robert H. Allen, Jameel Ibrahim
  • Patent number: 4851297
    Abstract: Particles of silicon and a p or n carrier substance which are in spherical or spheroidal form, and suitable for use in the preparation of doped semiconductor devices, can be prepared by a fluidized bed technique for chemical vapor deposition of a carrier substance (B, P, As or Sb). The prepared products have a kernel of high purity polysilicon and a layer of silicon/dopant alloy upon the kernel. Optionally, the particles have a thin outer layer of silicon.
    Type: Grant
    Filed: June 27, 1988
    Date of Patent: July 25, 1989
    Assignee: Ethyl Corporation
    Inventors: Robert H. Allen, Jameel Ibrahim
  • Patent number: 4789596
    Abstract: Particles of silicon and a p or n carrier substance which are in spherical or spheroidal form, and suitable for use in the preparation of doped semiconductor devices, can be prepared by a fluidized bed technique for chemical vapor deposition of a carrier substance (B, P, As or Sb). The prepared products have a kernel of high purity polysilicon and a layer of silicon/dopant alloy upon the kernel. Optionally, the particles have a thin outer layer of silicon.
    Type: Grant
    Filed: November 27, 1987
    Date of Patent: December 6, 1988
    Assignee: Ethyl Corporation
    Inventors: Robert H. Allen, Jameel Ibrahim