Abstract: A process for verifying an item deposit via a smart drop box. The process includes an item receptacle, a processor in communication with the item receptacle, a scanning device, and a database. The item receptacle is configured to receive an item from a user, scan the item, and generate item information. The processor is configured to compare the item information generated with identified item information from the database. If the information generated matches the information from the database, the item is accepted. In some embodiments, the deposit verification includes a printed receipt and/or an electronic verification.

Abstract: A pixel including a substrate and a plurality of photoconductive layers sequentially deposited on and substantially parallel to the substrate and configured to receive incident electromagnetic radiation. Each photoconductive layer is configured to absorb a different wavelength range of the incident electromagnetic radiation and configured to provide an indication of an amount of incident electromagnetic radiation within the corresponding wavelength range absorbed by the layer based on a change in the conductance of the layer.

Abstract: An optoelectronic device includes a submount and a lid. The submount includes a substrate and a lens and a laser above the substrate. The lid defines a cavity having a surface coated with a reflective material to form a 45 degree mirror. The mirror reflects a light from the laser to the lens and the light exits the optoelectronic device through the submount.

Abstract: A method for forming a diffractive lens includes forming an etch stop layer on a first surface of a silicon substrate, forming a diffractive optical element above the etch stop layer, forming a planarization layer covering the diffractive optical element, planarizing the planarization layer, forming a bonding layer on the planarization layer, bonding a transparent substrate on the bonding layer, and etching a second surface of the silicon substrate to the etch stop layer to remove a portion of the silicon substrate opposite the diffractive optical element, wherein the remaining portion of the silicon substrate forms a bonding ring.

Abstract: Diffractive optical elements and methods of making the same are described. In one aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple amorphous silicon phase shift layers having respective thicknesses selected so that the diffractive optical element is operable to phase shift infrared light within an operative wavelength range. The amorphous silicon phase shift layers are separated by respective silicon dioxide etch stop layers having respective thicknesses of about 5 nm or less. Layers of the multilayer structure are serially masked and etched to form a multi-step optical structure. In another aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple etch layers separated by respective etch stop layers selectively etchable with respect to the etch layers. One or more of the etch and etch stop layers are substantially opaque to light within an operative wavelength range.

Abstract: Diffractive optical elements and methods of making the same are described. In one aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple amorphous silicon phase shift layers having respective thicknesses selected so that the diffractive optical element is operable to phase shift infrared light within an operative wavelength range. The amorphous silicon phase shift layers are separated by respective silicon dioxide etch stop layers having respective thicknesses of about 5 nm or less. Layers of the multilayer structure are serially masked and etched to form a multi-step optical structure. In another aspect, a diffractive optical element is made by forming a multilayer structure comprising multiple etch layers separated by respective etch stop layers selectively etchable with respect to the etch layers. One or more of the etch and etch stop layers are substantially opaque to light within an operative wavelength range.