Abstract: Methods and apparatus to control architectural coverings are disclosed. An example apparatus includes a network interface to communicatively couple the apparatus with a repository via a network, a wireless covering interface to communicatively couple the apparatus with a first architectural covering, a covering enumerator to determine information about the first architectural covering, and a software collector to: retrieve software for the first architectural covering from a repository via the network interface, transmit an advertisement of the software to the first architectural covering, and in response to receiving a request for the software from the first architectural covering, transmit the software to the first architectural covering.

Abstract: Example architectural opening coverings and methods are disclosed. An example architectural opening covering system comprises a first motor to move a middle rail relative to a fixed top rail, and a second motor to move a bottom rail relative to the middle rail and the fixed top rail. The example system also comprises a controller to selectively actuate the first motor to move the middle rail based on a first position of the middle rail and a first position of the bottom rail, and to selectively actuate the second motor to move the bottom rail based on a second position of the middle rail and a second position of the bottom rail.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: An apparatus and method associated with the extension and retraction of a covering for an architectural opening. More particularly, an apparatus and method which monitors the extension of a shade to control the extension and position when the extension motion of the shade is interrupted.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: Example architectural opening coverings and methods are disclosed. An example architectural opening covering system comprises a first motor to move a middle rail relative to a fixed top rail, and a second motor to move a bottom rail relative to the middle rail and the fixed top rail. The example system also comprises a controller to selectively actuate the first motor to move the middle rail based on a first position of the middle rail and a first position of the bottom rail, and to selectively actuate the second motor to move the bottom rail based on a second position of the middle rail and a second position of the bottom rail.

Abstract: An apparatus and method associated with the extension and retraction of a covering for an architectural opening. More particularly, an apparatus and method which monitors the extension of a shade to control the extension and position when the extension motion of the shade is interrupted.

Abstract: A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.

Abstract: A controller for a device transmitting commands across one or more communication channels. Each such channel may employ a separate medium, such as radio waves and infrared light. The controller may transmit two separate signals to a device, where one signal is sent via radio waves and the other by infrared light. One signal may correspond to a group identifier and the other to an operating command to be carried out by the device. The device may receive both signals and, if the device belongs to a group corresponding to the group identifier, it may execute the operating command. Alternatively, the group identifier may be replaced by a wake command and the device may execute the operating command only if the wake command is received.

Abstract: A remote for controlling devices and communicating data to and from such devices using both IR and RF signals. The remote control may transmit a first signal to one or more devices which, in turn may each transmit a reply signal to the remote. Each reply signal typically, although not necessarily, contains an identification of the transmitting device and the signal strength of the first signal, as detected at the device. The remote may employ this information to determine which device is closest and transmit commands accordingly.

Abstract: A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.

Abstract: The present invention provide apparatus, systems and/or methods for use in controlling a distributed network of main powered devices and battery powered devices. The devices control the operation of one or more appliances. In one embodiment, an adaptive network comprises a main powered device, a battery powered device and a network control device. The network uses a wireless network protocol that includes at least one of a group, network, unit, group flag, mood and/or mask identifier. The network may include a data storage device having a data structure comprising a listing of at least one battery powered device with which the main powered device can communicate on the network, and/or a connectivity rating and ranking of networked devices. The network may also include: a network traffic manager, a routing and a controller identifier.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A tennis racket cover is provided with a measuring strap for measuring the height of a tennis net. A first end of the strap is attached to the cover, and a second end of the strap can be pulled away from the cover and positioned beyond a first end of the cover. The distance between a second end of the cover and the second end of the strap is about 36 inches.