Patents by Inventor James C. Utter

James C. Utter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6351871
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: March 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 6280527
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Publication number: 20010006116
    Abstract: A process of forming a multi-layer feature on a ceramic or organic article in which first and second layers of paste are sequentially screened through a screening mask wherein the screening mask has not been moved between screening steps. A structure produced by this process is also disclosed.
    Type: Application
    Filed: January 18, 2001
    Publication date: July 5, 2001
    Applicant: International Business Machines Corporation
    Inventors: James M. Blazick, Michael E. Cropp, James N. Humenik, Gerald H. Leino, Jawahar P. Nayak, Frank V. Ranalli, Deborah A. Sylvester, John A. Trumpetto, James C. Utter, Rao V. Vallabhaneni, Renne L. Weisman
  • Patent number: 6238741
    Abstract: A process of forming a multi-layer feature on a ceramic or organic article in which first and second layers of paste are sequentially screened through a screening mask wherein the screening mask has not been moved between screening steps. A structure produced by this process is also disclosed.
    Type: Grant
    Filed: December 7, 1998
    Date of Patent: May 29, 2001
    Assignee: International Business Machines Corporation
    Inventors: James M. Blazick, Michael E. Cropp, James N. Humenik, Gerald H. Leino, Jawahar P. Nayak, Frank V. Ranalli, Deborah A. Sylvester, John A. Trumpetto, James C. Utter, Rao V. Vallabhaneni, Renee L. Weisman
  • Patent number: 6062135
    Abstract: A screening apparatus including a table for holding an article; and a dual reservoir dispensing assembly. The dual reservoir assembly includes first and second reservoirs for holding first and second materials to be dispensed; first and second nozzles in communication with first and second reservoirs, respectively, for dispensing first and second materials; tilting apparatus for tilting the nozzles in a first direction so that the first nozzle is tilted into position for dispensing the first material and for tilting the nozzles in a second direction so that the first nozzle is tilted out of position and the second nozzle is tilted into position for dispensing the second material; and apparatus for moving the dual reservoir dispensing assembly with respect to the table wherein, in operation, the first nozzle is tilted into position during a first movement across the article and the second nozzle is titled into position during a second movement across the article.
    Type: Grant
    Filed: December 7, 1998
    Date of Patent: May 16, 2000
    Assignee: International Business Machines Corporation
    Inventors: Alvin W. Buechele, Karl O. Muggenburg, James C. Utter, Renee L. Weisman
  • Patent number: 6032683
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: March 7, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 5916374
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: June 29, 1999
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter