Patents by Inventor James David Strassner

James David Strassner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual wafer load lock
    Patent number: 6841200
    Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: January 11, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Joseph Arthur Kraus, James David Strassner
  • Dual wafer load lock
    Publication number: 20030167612
    Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.
    Type: Application
    Filed: March 17, 2003
    Publication date: September 11, 2003
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Joseph Arthur Kraus, James David Strassner
  • Dual wafer load lock
    Patent number: 6558509
    Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port area sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: May 6, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Joseph Arthur Kraus, James David Strassner
  • Dual wafer load lock
    Publication number: 20020005168
    Abstract: A method and apparatus for transferring a substrate between a first environment having a first pressure and a second environment having a vacuum pressure is provided. In one embodiment, the apparatus comprises a chamber body having a first port disposed in a first wall and a second port disposed in a second wall that seals the chamber from the first and second environments. A cooling plate, a first substrate holder and a second substrate holder are disposed within the chamber body. The cooling plate is disposed at the bottom of the chamber body. The first port and the second port are sequentially opened and the pressure within the load lock regulated to allow substrate to pass through the load lock. A window is disposed in the top of the chamber body that allows a metrology device to view the chamber volume.
    Type: Application
    Filed: July 16, 2001
    Publication date: January 17, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Joseph Arthur Kraus, James David Strassner