Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: One example LIDAR device comprises a substrate and a waveguide disposed on the substrate. A first section of the waveguide extends lengthwise on the substrate in a first direction. A second section of the waveguide extends lengthwise on the substrate in a second direction different than the first direction. A third section of the waveguide extends lengthwise on the substrate in a third direction different than the second direction. The second section extends lengthwise between the first section and the second section. The LIDAR device also comprises a light emitter configured to emit light. The waveguide is configured to guide the light inside the first section toward the second section, inside the second section toward the third section, and inside the third section away from the second section.

Abstract: One example LIDAR device comprises a substrate and a waveguide disposed on the substrate. A first section of the waveguide extends lengthwise on the substrate in a first direction. A second section of the waveguide extends lengthwise on the substrate in a second direction different than the first direction. A third section of the waveguide extends lengthwise on the substrate in a third direction different than the second direction. The second section extends lengthwise between the first section and the second section. The LIDAR device also comprises a light emitter configured to emit light. The waveguide is configured to guide the light inside the first section toward the second section, inside the second section toward the third section, and inside the third section away from the second section.

Abstract: Example embodiments relate to light detection and ranging (lidar) devices having vertical-cavity surface-emitting laser (VCSEL) emitters. An example lidar device includes an array of individually addressable VCSELs configured to emit light pulses into an environment surrounding the lidar device. The lidar device also includes a firing circuit configured to selectively fire the individually addressable VCSELs in the array. In addition, the lidar device includes a controller configured to control the firing circuit using a control signal. Further, the lidar device includes a plurality of detectors. Each detector in the plurality of detectors is configured to detect reflections of light pulses that are emitted by one or more individually addressable VCSELs in the array and reflected by one or more objects in the environment surrounding the lidar device.

Abstract: Example embodiments relate to light detection and ranging (lidar) devices having a light-guide manifold. An example lidar device includes a transmit subsystem. The transmit subsystem includes a light emitter. The transmit subsystem also includes a light-guide manifold optically coupled to the light emitter. Further, the transmit subsystem includes a telecentric lens assembly optically coupled to the light-guide manifold. The lidar device also includes a receive subsystem. The receive subsystem includes the telecentric lens assembly. The receive subsystem also includes an aperture plate having an aperture defined therein. The aperture plate is positioned at a focal plane of the telecentric lens assembly. Further, the receive subsystem includes a silicon photomultiplier (SiPM) positioned to receive light traveling through the aperture.

Abstract: The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.

Abstract: One example system comprises a plurality of substrates disposed in an overlapping arrangement. The plurality of substrates includes at least a first substrate and a second substrate. The system also comprises a first waveguide disposed on the first substrate to define a first optical path on the first substrate. The first waveguide is configured to guide light along the first optical path and to transmit, at an output section of the first waveguide, the light out of the first waveguide toward the second substrate. The system also comprises a second waveguide disposed on the second substrate to define a second optical path on the second substrate. An input section of the second waveguide is aligned with the output section of the first waveguide to receive the light transmitted by the first waveguide. The second waveguide is configured to guide the light along the second optical path.

Abstract: The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.

Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.

Abstract: Example embodiments relate to crosstalk reduction for light detection and ranging (lidar) devices using wavelength locking. An example embodiment includes a lidar device. The lidar device includes a first light emitter configured to emit a first light signal and a second light emitter configured to emit a second light signal. The lidar device also includes a first light guide and a second light guide. In addition, the lidar device includes a first light detector and a second light detector. Further, the lidar device includes a first wavelength-locking mechanism configured to use a portion of the first light signal to maintain a wavelength of the first light signal and a second wavelength-locking mechanism configured to use a portion of the second light signal to maintain a wavelength of the second light signal. The wavelengths of the first light signal and the second light signal are different.

Abstract: One example system comprises a plurality of substrates disposed in an overlapping arrangement. The plurality of substrates includes at least a first substrate and a second substrate. The system also comprises a first waveguide disposed on the first substrate to define a first optical path on the first substrate. The first waveguide is configured to guide light along the first optical path and to transmit, at an output section of the first waveguide, the light out of the first waveguide toward the second substrate. The system also comprises a second waveguide disposed on the second substrate to define a second optical path on the second substrate. An input section of the second waveguide is aligned with the output section of the first waveguide to receive the light transmitted by the first waveguide. The second waveguide is configured to guide the light along the second optical path.

Abstract: The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.

Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.

Abstract: One example system comprises a substrate and a waveguide disposed on the substrate to define an optical path on the substrate. The waveguide is configured to guide, inside the waveguide and along the optical path, a light signal toward an edge of the waveguide. The edge defines an optical interface between the waveguide and a fluidic optical medium adjacent to the edge of the waveguide. The system also includes an optical fluid and a fluid actuator configured to adjust a physical state of the optical fluid based on a control signal. The adjustment of the physical state of the optical fluid causes an adjustment of the fluidic optical medium adjacent to the edge.

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.

Abstract: One example LIDAR device comprises a substrate and a waveguide disposed on the substrate. A first section of the waveguide extends lengthwise on the substrate in a first direction. A second section of the waveguide extends lengthwise on the substrate in a second direction different than the first direction. A third section of the waveguide extends lengthwise on the substrate in a third direction different than the second direction. The second section extends lengthwise between the first section and the second section. The LIDAR device also comprises a light emitter configured to emit light. The waveguide is configured to guide the light inside the first section toward the second section, inside the second section toward the third section, and inside the third section away from the second section.

Abstract: One example system comprises a plurality of substrates disposed in an overlapping arrangement. The plurality of substrates includes at least a first substrate and a second substrate. The system also comprises a first waveguide disposed on the first substrate to define a first optical path on the first substrate. The first waveguide is configured to guide light along the first optical path and to transmit, at an output section of the first waveguide, the light out of the first waveguide toward the second substrate. The system also comprises a second waveguide disposed on the second substrate to define a second optical path on the second substrate. An input section of the second waveguide is aligned with the output section of the first waveguide to receive the light transmitted by the first waveguide. The second waveguide is configured to guide the light along the second optical path.

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.