Abstract: A memory structure includes a memory storage element electrically coupled to a control element. The control element comprises a tunnel-junction device. The memory storage element may also comprise a tunnel-junction device. Methods for fusing a tunnel-junction device of a memory storage element without fusing a tunnel-junction device of an associated control element are disclosed. The memory storage element may have an effective cross-sectional area that is greater than an effective cross-sectional area of the control element. A reference element comprising a tunnel-junction device may be used with a current source to fuse a memory storage element without fusing a tunnel-junction device of an associated control element. Methods of making the memory structure and using it in electronic devices are disclosed.

Abstract: This invention relates to a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film on a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; heating the film; causing the template to press against the heated film such that a portion of the film is deformed by the protrusions; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide.

Abstract: A method of manufacturing a nanowire filament includes forming and fusing actions. In a forming action, close proximity conductors are formed. In another forming action, a junction oxide is formed between the close proximity conductors. In a fusing action, a nanowire filament is fused between the close proximity conductors, through the junction oxide. A circuit is also provided, having first and second close proximity conductors, and a nanowire filament fused between the close proximity conductors.

Abstract: A self-assembled photonic crystal is formed using a template made by nanoimprint lithography. A layer of imprintable material is deposited on a substrate, a pattern is imprinted in the imprintable material to form a template (the pattern of the template being adapted to substantially constrain colloidal particles to a predetermined lattice), and colloidal particles are introduced onto the template, substantially filling the predetermined lattice.