Patents by Inventor James F. Cameron

James F. Cameron has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOACID GENERATOR
    Publication number: 20170192352
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 22, 2016
    Publication date: July 6, 2017
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST COMPOSITION, AND METHOD OF FORMING ELECTRONIC DEVICE
    Publication number: 20170192353
    Abstract: A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Application
    Filed: December 22, 2016
    Publication date: July 6, 2017
    Inventors: Emad Aqad, William Williams, III, James F. Cameron
  • COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20170108776
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: January 26, 2015
    Publication date: April 20, 2017
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9606434
    Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: March 28, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
    Patent number: 9581901
    Abstract: A copolymer includes repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl (meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and R5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: February 28, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Owendi Ongayi, James W. Thackeray, James F. Cameron
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9557642
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: January 31, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Phenolic polymers and photoresists comprising same
    Patent number: 9557646
    Abstract: The present invention relates to new polymers that contain phenolic groups spaced from a polymer backbone and photoacid-labile group. Preferred polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
    Type: Grant
    Filed: January 12, 2015
    Date of Patent: January 31, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: James F. Cameron
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9551930
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: January 24, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9527936
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: December 27, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Acid generators and photoresists comprising same
    Patent number: 9499513
    Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: November 22, 2016
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Vipul Jain, Paul J. Labeaume, Jin Wuk Sung, James W. Thackeray
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9470976
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9469705
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
    Publication number: 20160103391
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
    Publication number: 20160103392
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
    Publication number: 20160102158
    Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
    Publication number: 20160102157
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20160009924
    Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: November 10, 2014
    Publication date: January 14, 2016
    Inventors: John P. Amara, James F. Cameron, Jin W. Sung, Gregory P. Prokopowicz
  • ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20160002199
    Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
    Type: Application
    Filed: February 2, 2015
    Publication date: January 7, 2016
    Inventors: James F. Cameron, Vipul Jain, Paul J. Labeaume, Jin Wuk Sung, James W. Thackeray
  • Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
    Patent number: 9229319
    Abstract: A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl(meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and Ar are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: January 5, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Owendi Ongayi, James W. Thackeray, James F. Cameron
  • PHENOLIC POLYMERS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20150355542
    Abstract: The present invention relates to new polymers that contain phenolic groups spaced from a polymer backbone and photoacid-labile group. Preferred polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
    Type: Application
    Filed: January 12, 2015
    Publication date: December 10, 2015
    Inventor: James F. Cameron