Abstract: A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in response to the beam being incident upon the fiducial grid; determines frequency components of the detected signal; and determines a two-dimensional location of the beam from phases of two determined fundamental frequency component. The method or system further determines a size of the beam from relative amplitudes of the determined fundamental and harmonic frequency components and/or determine a shape of the beam from relative amplitudes of the determined fundamental and harmonic frequency components. The method or system corrects a deflection of the beam in response to the determined two-dimensional location, and/or adjusts the size of the beam in response to the determined size, and/or adjusts the shape of the beam in response to the determined shape.

Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.

Abstract: An integrated micro-photomultiplier is disclosed which employs sub-micron-wide channels for electron amplification. These channels are created with standard lithographic and planar-fabrication techniques, and sealed with a vacuum-deposition process. A photocathode, continuous dynode, anode and signal-collector are fabricated along the channels. This photomultiplier design obviates the needs for through-substrate etching, and mechanical assembly of separate layers. Because large-scale-integration techniques can be used to fabricate multiple micro-photomultipliers, significant reductions in device cost and size are expected. The integrated micro-photomultiplier is useful for high-speed, low-light-level optical detection, and may find applications in optical communications, visible or infrared imaging, and chemical or biological sensing.

Abstract: Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within the shaped or patterned charged particle beam. Light output from fiducial marks preferably formed of a scintillating material is reduced when the dithered shadow pattern is incident on some or all of the fiducial marks. The timing of the incidence of the shadow pattern on fiducial marks indicates the position of the shaped or patterned charged particle beam such that correction of the beam position on the target can be corrected to a small fraction of system resolution. The dither pattern and repetition period is chosen to avoid interference with uniformity of beam illumination of the target. Feedback of position error thus provides phase locked position correction in real time and is suitable for mask making since the fiducial marks are not intrusive.

Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.

Abstract: A very-high-density memory device which utilizes a scintillating medium for data storage. In one mode, the device operates as a read-only-memory (ROM) unit. In another mode, the device functions as a one-time-write (OTW) and then read-only-memory unit. In an exemplary embodiment, information is read at high data rates from a rotating data-storage disk or cylinder with an electron beam and sensitive photodetector. Two methods of following the data tracks on the storage medium are provided. Masks are provided for use in patterning the data or data tracks. These masks may also be used to pattern very-high-density media for other applications such as magnetic memory and optical near-field memory. A method of patterning radially-periodic structures using interferometric lithography is also provided.

Abstract: Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within the shaped or patterned charged particle beam. Light output from fiducial marks preferably formed of a scintillating material is reduced when the dithered shadow pattern is incident on some or all of the fiducial marks. The timing of the incidence of the shadow pattern on fiducial marks indicates the position of the shaped or patterned charged particle beam such that correction of the beam position on the target can be corrected to a small fraction of system resolution. The dither pattern and repetition period is chosen to avoid interference with uniformity of beam illumination of the target. Feedback of position error thus provides phase locked position correction in real time and is suitable for mask making since the fiducial marks are not intrusive.

Abstract: A very-high-density memory device which utilizes a scintillating medium for data storage. In one mode, the device operates as a read-only-memory (ROM) unit. In another mode, the device functions as a one-time-write (OTW) and then read-only-memory unit. In an exemplary embodiment, information is read at high data rates from a rotating data-storage disk or cylinder with an electron beam and sensitive photodetector. Two methods of following the data tracks on the storage medium are provided. Masks are provided for use in patterning the data or data tracks. These masks may also be used to pattern very-high-density media for other applications such as magnetic memory and optical near-field memory. A method of patterning radially-periodic structures using interferometric lithography is also provided.

Abstract: A scintillating fiducial pattern, and methods of fabricating and using same, on a substrate or a resist/substrate composite, where the scintillating fiducial pattern is used in a spatial referencing scheme. The invention includes the use of a scintillating fiducial pattern as alignment or reference marks on a resist/substrate composite, into which a pattern or feature is to be defined. The invention includes the use of a scintillating fiducial in a mask alignment scheme. The invention includes the use of a scintillating fiducial grid or grating in conjunction with an energy beam locating method, or spatial-phase-locked electron-beam lithography. Spatial referencing to the scintillating fiducial grid, or grating, may be implemented with a delay-locked loop, which locks the phase of a signal from the scintillating grid, or grating, to the phase of a known signal.