Abstract: An agricultural harvester, such as a combine harvester, which has an auxiliary axle assembly for support of the feeder house of the harvester. The auxiliary axle assembly can be provided in a retracted position when in a field mode, and can be locked in an extended position when in a road mode, where a wheel of the assembly contacts the ground. When in the locked, extended position, the auxiliary axle assembly supports substantially all of the weight of the feeder house and any attached implements, allowing the feeder house to pivot relative to the main chassis of the harvester.

Abstract: An agricultural harvester, such as a combine harvester, which has an auxiliary axle assembly for support of the feeder house of the harvester. The auxiliary axle assembly can be provided in a retracted position when in a field mode, and can be locked in an extended position when in a road mode, where a wheel of the assembly contacts the ground. When in the locked, extended position, the auxiliary axle assembly supports substantially all of the weight of the feeder house and any attached implements, allowing the feeder house to pivot relative to the main chassis of the harvester.

Abstract: A panel for use on an agricultural vehicle, such as a combine harvester, used to cover a portion of the interior of the vehicle, and is formed from a flexible sheet material provided on a substantially rigid sub-frame. The flexible sheet material can be arranged to be easily opened or removed from the sub-frame, providing relatively easy access to the vehicle interior, combined with a relatively light-weight structure.

Abstract: A self-propelled harvester such as a combine harvester including a frame having a main frame assembly and a pair of secondary frame members attached thereto. The main frame assembly supports crop processing apparatus. A feederhouse and a tangential-flow crop impelling rotor are journaled between the secondary frame members. The secondary frame members are conveniently removable from the main frame assembly for accessing the processing apparatus from a front end of the harvester.

Abstract: A self-propelled harvester such as a combine harvester including a frame having a main frame assembly and a pair of secondary frame members attached thereto. The main frame assembly supports crop processing apparatus. A feederhouse and a tangential-flow crop impelling rotor are journaled between the secondary frame members. The secondary frame members are conveniently removable from the main frame assembly for accessing the processing apparatus from a front end of the harvester.

Abstract: Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.

Abstract: Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.

Abstract: Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.

Abstract: Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.

Abstract: In a plasma processing chamber, a method and an arrangement to stabilize pressure are provided. The method includes providing coarse pressure adjustments in an open-loop manner and thereafter providing fine pressure adjustments in a closed-loop manner. The coarse pressure adjustments are performed by rapidly re-position confinement rings employing an assumed linear relationship between the conductance and the confinement rings position to bring the pressure in the plasma generating region quickly to roughly a desired set point. The fine pressure adjustments are performed by at least employing mechanical vacuum pump(s), turbo pump(s), confinement ring positioning and/or combinations thereof to achieve a derive pressure set point.

Abstract: Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.

Abstract: An oven for bonding adhesives to the back surface of a textile article includes a housing with a transport frame for passing the textile article through a curing chamber within the housing. The oven also has an air source and a duct system that delivers an airflow into a cool zone on the opposite, pile surface side of the textile article. The airflow has a lower temperature than the elevated temperature of the curing chamber and is supplied to the cool zone in sufficient amounts such that the pressure in the cool zone exceeds the ambient pressure in the curing chamber.

Abstract: Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.

Abstract: Plasma confinement rings are adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to substantially reduce polymer deposition on those surfaces. The plasma confinement rings include an RF lossy material effective to enhance heating at portions of the rings. A low-emissivity material can be provided on a portion of the plasma confinement ring assembly to enhance heating effects.

Abstract: In a plasma processing chamber, a method and an arrangement to stabilize pressure are provided. The method includes providing coarse pressure adjustments in an open-loop manner and thereafter providing fine pressure adjustments in a closed-loop manner. The coarse pressure adjustments are performed by rapidly re-position confinement rings employing an assumed linear relationship between the conductance and the confinement rings position to bring the pressure in the plasma generating region quickly to roughly a desired set point. The fine pressure adjustments are performed by at least employing mechanical vacuum pump(s), turbo pump(s), confinement ring positioning and/or combinations thereof to achieve a derive pressure set point.

Abstract: Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.

Abstract: Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.

Abstract: An oven for bonding adhesives to the back surface of a textile article includes a housing with a transport frame for passing the textile article through a curing chamber within the housing. The oven also has an air source and a duct system that delivers an airflow into a cool zone on the opposite, pile surface side of the textile article. The airflow has a lower temperature than the elevated temperature of the curing chamber and is supplied to the cool zone in sufficient amounts such that the pressure in the cool zone exceeds the ambient pressure in the curing chamber.

Abstract: Described is a cooling system for use in the manufacture of substrates into magnetic disk memory in which cooling plates are positioned dynamically in relation to a substrate to be cooled. This enables positioning the cooling plates closer for more effective cooling. Positioning is controlled by capacitive measurements between the cooling plates and the substrate to be cooled.

Abstract: A substrate processing system includes a processing chamber, an electrically floating substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least one ion source located in the chamber, and a power source for energizing the ion source by positively biasing the anode and negatively biasing the cathode in a train of pulses of selectably variable duty cycle and magnitude to maintain a selected time averaged current, the bias in each instance being relative to the chamber. The ion source ionizes the process gas producing ions for processing a substrate disposed on the floating substrate holder in the chamber. The floating substrate is biased in accord with the net charge thereon as controlled by the energetic electron flux. One embodiment includes two such ion sources.