Patents by Inventor James Lamb, III

James Lamb, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for making polymers with intrinsic light-absorbing properties
    Patent number: 5578676
    Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: November 26, 1996
    Inventors: Tony Flaim, James Lamb, III, Kimberly A. Moeckli, Terry Brewer
  • Method of manufacturing microelectronic devices having multifunctional photolithographic layers
    Patent number: 5401613
    Abstract: A photolithographic composition having improved processability and which eliminates the need for interlayering multiple special purpose coatings in the production of microelectronic devices is surprisingly made possible by selective dissolution of a polymer and an effective light attenuating material in critical solvents. The polymers which are used in the present invention include homopolymers and copolymers of poly(vinylpyridine).
    Type: Grant
    Filed: February 12, 1992
    Date of Patent: March 28, 1995
    Assignee: Brewer Science
    Inventors: Terry Brewer, James Lamb, III, J. Michael Mori
  • Microlithographic substrate cleaning and compositions therefor
    Patent number: 5362608
    Abstract: THFA (tetrahydrofurfuryl alcohol) is employed as the active component of edge bead removal compositions negating the need for N-methylpyrrolidone and providing unexpected effectiveness for multilayer microelectronic edge beads having at least one highly polar aromatic polymer layer, particularly when such layer is adjacent to an acid-catalyzed photoresist.
    Type: Grant
    Filed: August 24, 1992
    Date of Patent: November 8, 1994
    Assignee: Brewer Science, Inc.
    Inventors: Tony D. Flaim, James Lamb, III, Terry Brewer
  • Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
    Patent number: 5234990
    Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
    Type: Grant
    Filed: February 12, 1992
    Date of Patent: August 10, 1993
    Assignee: Brewer Science, Inc.
    Inventors: Tony Flaim, James Lamb, III, Kimberly A. Moeckli, Terry Brewer