Abstract: A stepper motor control system is disclosed. The stepper motor including a rotor positioned within a stator for relative motion. The stepper motor further includes a control system associated with the stator and rotor for controlling relative motion. The control system is a resonant circuit which conserves electrical charge includes a first winding positioned between a first electrical charge source and a first capacitor assembly; a first switch controlling the flow of electrical charge between the first electrical charge source and the first capacitor assembly through the first winding in a first direction; and a second switch controlling the flow of electrical charge from the first capacitor assembly and through the first winding in a second direction. In use, phase one begins with the opening of the first switch, causing the flow of electrical charge through the first winding in a first direction and a predetermined relative movement between the stator and rotor.

Abstract: A boolean multiplier is disclosed. The boolean multiplier includes a plurality of input buffers for storing a first operand and a second operand. The multiplier also includes a first set of gates coupled to the input buffers, the first set of gates respectively combining the first operand and the second operand with Boolean function to produce logical products. The multiplier further includes a second set of gates coupled to the first set of gates, the second set of gates respectively combining the logical products with Boolean functions to produce specific product bits.

Abstract: A telescopically extendable elongate pipe hangar has resilient connector grommets affixed to opposed ends. The grommets snap rigidly into standard punch holes or knockouts to secure the pipe hangar to metal construction studs. The hangar has spaced boreholes along at least one side for receiving screws or bolts attaching clamps at selective locations to space and support pipes.

Abstract: An eye protection device comprising two eye cups joined by a bridge with the eye cups being mirror images of each other, each of the eye cups being generally oblong as viewed from the front with longer tops and bottoms and shorter inner and outer sides, each of the eye cups having a substantially flat front surface with an opening and a lens positioned in the opening, with the outer side of each of the eye cups projecting rearwardly at least about twice as far as the inner side and with the top and bottom of each of the eye cups having concave curved rear edges, with the bridge and the eye cup tops substantially in parallel horizontal planes, and with the bridge having an arch extending forwardly of the eye cups at least about the length of the eye cup inner edges. In the preferred embodiment, the design is a molded unitary piece.

Abstract: A high contrast developing process is described for use after pre-exposure to UV-visible radiation to produce increased sensitivity during lithographic processing of positive resist layers. Compared to samples which have not been subjected to the methods of this invention, sensitivity increases of a factor of 2-4 are to be expected. An additional benefit of low film loss from unexposed resist is obtained. The system disclosed is applicable to lithographic exposures utilizing electrons, photon (e.g. UV-visible, x-rays, etc.) and atomic or molecular charged particles. Specifically, as a result of the increased sensitivity, higher throughput during lithographic processing for the fabrication of photomasks and semiconductor devices is realized.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: High contrast, sensitivity and bath life is obtainable by the addition of inorganic salts, preferably a carbonate, to an aqueous alkali metal base containing a carboxylated surfactant. The preferred alkali metal bases are potassium hydroxide or sodium hydroxide. The carboxylated surfactants contemplated by the invention are those encompassed with the formula:R--O--(CH.sub.2 H.sub.4 O).sub.n --CH.sub.2 --COOXwherein R is a hydrocarbon radical of 6-18 carbon atoms alkyl radical, n has a value of 1-24 and X is a cation such as K.sup.+, Na.sup.+, or H.sup.+. The gain in sensitivity with the incorporation of an inorganic compound furnishing ions, typically an inorganic salt, to the developer with the carboxylated surfactant compared to the sensitivity obtained with developers with carboxylated surfactant and inorganic salts omitted was typically two fold and greater without a corresponding film loss. Examples of salts are those that contain the anions SO.sub.4.sup.2-, CO.sub.3.sup.2-, Cl.sup.-, PO.sub.4.sup.

Abstract: A novel low metal ion developer composition used in a two step process which provided high contrast images and long developer bath life is provided. The process gives high contrast images. The substrate coated with positive photoresist is exposed then immersed in a "predip" bath, rinsed, and then, immersed in the developer bath, rinsed and dried. This process provided high contrast which does not decrease over the life of the developer system. The system consists of (1) a predip solution containing aqueous non-metal ion organic base and a cationic surfactant adjusted to a concentration that does not give development, and (2) a developer solution containing an aqueous solution of an non-metal ion organic base and a fluorochemical surfactant adjusted to a concentration that provides development. The high contrast is achieved by the cationic surfactant coating the resist and inhibiting the attack on the unexposed resist by the developer while permitting the developer to dissolve away the exposed resist.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a fluorocarbon surfactant. The incorporation of the fluorocarbon surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the fluorocarbon surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 10.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps or topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: A positive photoresist aqueous alkaline two-step developing method is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a fluorocarbon or carboxylated surfactant. The incorporation of the fluorocarbon or carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. A double dip method in effecting development of the exposed film is used. The contrast and sensitivity of the photoresist remains essentially unchanged over the life of the bath.The high contrast photoresist provides linewidth control and affords improved processing uniformity in photoresist imaging.

Abstract: A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

Abstract: A photosensitive composition useful as a photoresist which may be completely processed by dry techniques, especially by means of an oxygen plasma.The composition includes an N-vinylmonomer and an organic hydrogen compound in a binder which contributes significantly to the utility of the composition in the fabrication of micro-electronic devices.

Abstract: A non-silver photosensitive image forming composition containing at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compound and tetraiodoethylene in a dried photosensitive layer thickness not exceeding 3 microns in layer thickness, the nature of the substitution being such that substantially any high extinction absorption peak or combination of high extinction absorption peaks is available from a family of compositions covering the range of 350 to 900 nm in wavelength, said composition being placed on a transparent or reflective substrate fitted with a compatible adhesive for the photosensitive layer not more than 0.

Abstract: A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carbazole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.

Abstract: Photoresists are developed and the supporting substrate is etched simultaneously therewith by bringing the resist (after exposure) into physical contact with a fluid containing a developer for the resist and an etchant for the supporting substrate.

Abstract: This application describes a photosensitive composition which prints out directly as a black or near neutral image when exposed photographically and which has a greatly improved speed.