Patents by Inventor James Manka

James Manka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focus monitoring method using asymmetry embedded imaging target
    Patent number: 9466100
    Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: October 11, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: DongSub Choi, Bill Pierson, David Tien, James Manka, Dongsuk Park
  • Focus recipe determination for a lithographic scanner
    Patent number: 9291920
    Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. An optical signal including at least a first variable and a second variable is detected by an optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: March 22, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: James Manka, David Tien, Christian Sparka
  • Focus Recipe Determination for a Lithographic Scanner
    Publication number: 20140063478
    Abstract: The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. According to an embodiment, an optical signal including at least a first variable and a second variable is detected by a optical analysis system from at least one test sample for a plurality of programmed focus error values. A first variable value showing sensitivity to focus is selected based upon a corresponding responsiveness of the second variable to change of focus and/or a corresponding linearity of raw focus with respect to the programmed focus error. At least one focus value for the lithographic scanner is determined based upon at least one determined raw focus value corresponding to the selected first variable value.
    Type: Application
    Filed: August 30, 2013
    Publication date: March 6, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: James Manka, David Tien, Christian Sparka
  • Focus Monitoring Method Using Asymmetry Embedded Imaging Target
    Publication number: 20130336572
    Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
    Type: Application
    Filed: June 3, 2013
    Publication date: December 19, 2013
    Inventors: DongSub Choi, Bill Pierson, David Tien, James Manka, Dongsuk Park