Patents by Inventor James Natwora

James Natwora has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low zirconium, hafnium-containing compositions, processes for the preparation thereof and methods of use thereof
    Publication number: 20060193979
    Abstract: This invention relates to hafnium-containing compositions having a zirconium concentration of less than about 500 parts per million, a process for producing the hafnium-containing compositions, organometallic precursor compositions containing a hafnium-containing compound and having a zirconium concentration of less than about 500 parts per million, a process for producing the organometallic precursor compositions, and a method for producing a film or coating from the organometallic precursor compositions. The organometallic precursor compositions are useful in semiconductor applications as chemical vapor deposition (CVD) or atomic layer deposition (ALD) precursors for film depositions.
    Type: Application
    Filed: May 2, 2006
    Publication date: August 31, 2006
    Inventors: Scott Meiere, James Natwora