Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: A laser cutter and safe power system therefor are disclosed. The power system of the laser cutter includes a resistive device arranged in a return line and configured to prevent anomalous tripping of a GFCI device by significantly minimizing electrical noise transmitted through the GFCI device when the laser cutter is operated in certain modes, such as a pulsing mode. The resistive device includes end caps that form a shroud around the connection between a return wire and the contact at each end of the resistive device. A main control board for a high voltage subsystem of the power system includes two isolated and independent enable signals, which are provided to different controllers on the main control board such that the different controllers can independently and redundantly respond to an unsafe condition.

Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: An apparatus for the treatment of a liquid comprising includes a chamber having at least one inner surface. The chamber is at least 80 percent enclosed. The apparatus also includes an ultraviolet (UV) transmissive tube and the UV transmissive tube disposed within the chamber and adapted for the passage of the liquid therethrough. The apparatus further includes an UV lamp and the UV lamp being disposed within the UV transmissive tube. A reflective material is interspersed between the chamber and the transmissive tube, and the reflective material is adapted so as to reflect at least a portion of light emitted by the UV lamp. Additionally, the reflective material is at least 80 percent reflective.

Abstract: A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Abstract: A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Abstract: A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Abstract: An apparatus for the treatment of a liquid that includes a chamber having at least one inner surface, the chamber adapted for passage of a fluid therethrough. The chamber is at least 80 percent enclosed. The apparatus also includes an optional ultraviolet-transmissive tube disposed within the chamber and also adapted for the passage of the liquid therethrough. The apparatus further includes an ultraviolet lamp disposed within the chamber and, optionally, within the ultraviolet-transmissive tube. A reflective material is interposed between the chamber and the transmissive tube. The reflective material is adapted so as to reflect at least a portion of light emitted by the ultraviolet lamp, wherein the reflective material is at least 80 percent reflective.

Abstract: An apparatus for the treatment of a liquid comprising includes a chamber having at least one inner surface. The chamber is at least 80 percent enclosed. The apparatus also includes an ultraviolet (UV) transmissive tube and the UV transmissive tube disposed within the chamber and adapted for the passage of the liquid therethrough. The apparatus further includes an UV lamp and the UV lamp being disposed within the UV transmissive tube. A reflective material is interspersed between the chamber and the transmissive tube, and the reflective material is adapted so as to reflect at least a portion of light emitted by the UV lamp. Additionally, the reflective material is at least 80 percent reflective.

Abstract: This invention relates generally to methods and apparatuses for the treatment of liquids and gases using ultraviolet light. In one embodiment, a substantially enclosed chamber coated with a reflective material containing an ultraviolet lamp and an ultraviolet transmissive tube running through the chamber for the treatment of liquid passed therethrough is disclosed.

Abstract: A discharge device for operation in a gas at a prescribed pressure includes cathode that is at least partially enclosed by a dielectric layer. The dielectric layer is at least partially enclosed by an anode. The dielectric and the anode have one or more aligned penetrations therein. The cathode may be hollow to allow a cooling fluid to circulate inside the cathode to cool the lamp.

Abstract: A high pressure gas discharge device and methods of using the device as a UV gas discharge light source are disclosed. The device has a cathode covered partially with a dielectric layer which separates the cathode from an anode. A discharge device utilizes one or more microhollows in the uncovered part of the cathode. Methods of utilizing the discharge devise as a gas discharge light source for producing ultrapure water.

Abstract: A high pressure gas discharge device and methods of using the device as a UV gas discharge light source are disclosed. The device has a cathode covered partially with a dielectric layer which separates the cathode from an anode. A discharge device utilizes one or more microhollows in the uncovered part of the cathode. Methods of utilizing the discharge devise as a gas discharge light source for producing ultapure water.

Abstract: A high pressure gas discharge device and methods of using the device as a UV gas discharge light source are disclosed. The device has a cathode covered partially with a dielectric layer which separates the cathode from an anode. A discharge device utilizes one or more microhollows in the uncovered part of the cathode. Methods of utilizing the discharge devise as a gas discharge light source for producing ultapure water.