Patents by Inventor James Tietz

James Tietz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11932575
    Abstract: A tinted glass composition and glass article including the same, the composition including: about 45 mol % to about 80 mol % SiO2; about 6 mol % to about 22 mol % Al2O3; 0 mol % to about 25 mol % B2O3; about 7 mol % to about 25 mol % of at least one alkaline earth oxide selected from MgO, CaO, SrO, BaO, and combinations thereof, about 0.5 mol % to about 20 mol % CuO; 0 mol % to about 6 mol % SnO2, SnO, or a combination thereof, 0 mol % to about 1.0 mol % C; 0 mol % to about 5 mol % La2O3; and 0 mol % to about 10 mol % PbO, and that is substantially free of alkali metal.
    Type: Grant
    Filed: January 3, 2023
    Date of Patent: March 19, 2024
    Assignee: CORNING INCORPORATED
    Inventors: Heather Debra Boek, Timothy James Kiczenski, Lisa Anne Tietz Moore, Natesan Venkataraman, Mark Owen Weller
  • Publication number: 20210070212
    Abstract: The present invention is to a self-propelled boat launch and methods of operating components of the boat launch a launch vehicle. The launch vehicle includes a partially submersible generally frame. The frame comprises a front frame unit and a modular carriage frame section, comprising at least one modular carnage frame. The boat launch is self-propelled with track assemblies driven by a hydraulic system powered by an engine assembly. The engine assembly is preferably mounted on top of the front frame unit. At least two track assemblies are in removable communication with a modular carriage frame. A track tensioner is provided for increased tension on a continuous track of the track assembly. A track cleaner is described for removal of foreign objects from at least one track assembly. Further, a method of operating the track tensioner is described. A method of operating the track cleaner is described.
    Type: Application
    Filed: September 2, 2020
    Publication date: March 11, 2021
    Applicant: Beachworks, LLC
    Inventors: Roger James Tietz, Jonathon D. Nemke, Michael W. Kawalske
  • Publication number: 20070021935
    Abstract: Methods of measuring gas flow rates in a gas supply system for supplying gas to a plasma processing chamber are provided. In a differential flow method, a flow controller is operated at different set flow rates, and upstream orifice pressures are measured for the set flow rates at ambient conditions. The measured orifice pressures are referenced to a secondary flow verification method that generates corresponding actual gas flow rates for the different set flow rates. The upstream orifice pressures can be used as a differential comparison for subsequent orifice pressure measurements taken at any temperature condition of the chamber. In an absolute flow method, some parameters of a selected gas and orifice are predetermined, and other parameters of the gas are measured while the gas is being flowed from a flow controller at a set flow rate through an orifice. In this method, any flow controller set point can be flowed at any time and at any chamber condition, such as during plasma processing operations.
    Type: Application
    Filed: July 12, 2005
    Publication date: January 25, 2007
    Inventors: Dean Larson, Robert Hefty, James Tietz, Williams Kennedy, Eric Lenz, William Denty, Enrico Magni
  • Publication number: 20050136682
    Abstract: A method for etching a layer over a substrate is provided. A gas-modulated cyclic process is performed for more than three cycles. Each cycle comprises performing a protective layer forming phase using first gas chemistry with a deposition gas chemistry, which is performed in about 0.0055 to 7 seconds for each cycle and performing an etching phase for the feature through the etch mask using a second gas chemistry using a reactive etching gas chemistry, which is performed in about 0.005 to 14 seconds for each cycle. The protective layer forming phase comprises providing the deposition gas and forming a plasma from the deposition gas. Each etching phase comprises providing a reactive etching gas and forming a plasma from the reactive etching gas.
    Type: Application
    Filed: February 11, 2005
    Publication date: June 23, 2005
    Inventors: Eric Hudson, James Tietz