Patents by Inventor James Vanell

James Vanell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5908508
    Abstract: The apparatus includes a gas diffuser plate having an integral heat pipe for accurately controlling the temperature of the diffuser plate during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning device in which the diffuser plate acts as an RF electrode, the heat pipe tube acts as an RF input lead, and the apparatus further includes a connector to an RF power source. Additionally, in combination, the heat pipe-cooled gas diffuser plate and RF electrode may be used advantageously in plasma enhanced chemical vapor deposition (PECVD).
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: June 1, 1999
    Assignee: Tokyo Electron Limited
    Inventors: James Vanell, Al Garcia
  • Patent number: 5647911
    Abstract: The apparatus includes a gas diffuser plate having an integral heat pipe for accurately controlling the temperature of the diffuser plate during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning device in which the diffuser plate acts as an RF electrode, the heat pipe tube acts as an RF input lead, and the apparatus further includes a connector to an RF power source. Additionally, in combination, the heat pipe-cooled gas diffuser plate and RF electrode may be used advantageously in plasma enhanced chemical vapor deposition (PECVD).
    Type: Grant
    Filed: December 14, 1993
    Date of Patent: July 15, 1997
    Assignees: Sony Corporation, Materials Research Corp.
    Inventors: James Vanell, Al Garcia