Patents by Inventor James W. Irving

James W. Irving has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230415195
    Abstract: A superstrate can include a body, a first layer, and a second layer, wherein the first layer is disposed between the body and the second layer. Each of the first and second layers has a proximal surface and a distal surface opposite the proximal surface, wherein the body is closer to the proximal surface than to the distal surface. An Ra of the distal surface of the second layer is less than an Ra of the distal surface of the first layer. In a method of making the superstrate, the relatively high Ra of the distal surface of the first layer may be related to the process or equipment used in forming the first layer. The second layer can be formed using another superstrate, where the Ra of the distal surface of the second layer is substantially the same as the contact surface of the other superstrate.
    Type: Application
    Filed: June 28, 2022
    Publication date: December 28, 2023
    Inventors: Niyaz KHUSNATDINOV, Weijun Liu, James W. Irving
  • Patent number: 11768445
    Abstract: A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: September 26, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: James W. Irving, Mehul N. Patel
  • Patent number: 11762295
    Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: September 19, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher, Logan L. Simpson, James W. Irving
  • Patent number: 11747731
    Abstract: A shaping system and method of shaping with the shaping system. The shaping system may include a spatial light modulator. The shaping system may include a radiation source to illuminate the spatial light modulator with actinic radiation. The shaping system may include a beam splitter configured to receive actinic radiation from the spatial light modulator and emit a first image of the spatial light modulator and a second image of the spatial light modulator. The shaping system may include a beam combiner configured to receive the first image and the second image and emit a combined image. The combined image may include the first image; and the second image offset from the first image. The shaping system may include a projection system configured to receive the combined image and illuminate formable material between a template and a substrate with a projected image at a plane of the formable material.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: September 5, 2023
    Assignee: CANON KABISHIKI KAISHA
    Inventors: James W. Irving, Edward Brian Fletcher, Nilabh Kumar Roy
  • Publication number: 20230053682
    Abstract: A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.
    Type: Application
    Filed: August 20, 2021
    Publication date: February 23, 2023
    Inventors: James W. Irving, Mehul N. Patel
  • Publication number: 20220163893
    Abstract: A shaping system and method of shaping with the shaping system. The shaping system may include a spatial light modulator. The shaping system may include a radiation source to illuminate the spatial light modulator with actinic radiation. The shaping system may include a beam splitter configured to receive actinic radiation from the spatial light modulator and emit a first image of the spatial light modulator and a second image of the spatial light modulator. The shaping system may include a beam combiner configured to receive the first image and the second image and emit a combined image. The combined image may include the first image; and the second image offset from the first image. The shaping system may include a projection system configured to receive the combined image and illuminate formable material between a template and a substrate with a projected image at a plane of the formable material.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 26, 2022
    Inventors: James W. Irving, Edward Brian Fletcher, Nilabh Kumar Roy
  • Publication number: 20220128907
    Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.
    Type: Application
    Filed: October 28, 2020
    Publication date: April 28, 2022
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher, Logan L. Simpson, James W. Irving
  • Patent number: 11262651
    Abstract: A method of inspecting a dispenser including a faceplate comprises translating a sensor across the faceplate while measuring a distance between the sensor and the faceplate. The sensor is oriented such that a longitudinal axis of the sensor extends at an acute angle relative to a longitudinal axis of the faceplate. The method may include translating another sensor across the faceplate while measuring the same distance. Or the method may include another translating of the sensor across the faceplate while measuring the same distance. In either case, the sensor is oriented such that the longitudinal axis of the sensor extends at an obtuse angle relative to the longitudinal axis of the faceplate. The method includes determining, based on the measured distances, whether an amount of accumulated formable material on the surface of the faceplate is greater than a predetermined value.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: March 1, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Craig William Cone, Steven C. Shackleton, Brent Andrew Snyder, James W. Irving, Brandyn L. Kinsey
  • Patent number: 11215921
    Abstract: A fabrication method comprises selecting an initial drop pattern defining a position of drops of a formable material, the initial drop pattern comprising a grid pattern of drops, designating the drops of the grid pattern to be dispensed by a first series of nozzles of a dispenser based on a spacing between drops in the Y-dimension; generating a modified drop pattern by shifting the grid pattern in a first direction along the Y-dimension, wherein a shift distance is selected such that the drops of the shifted grid pattern are designated to be dispensed from a second series of nozzles of the dispenser; dispensing the plurality of drops according to the modified drop pattern onto a substrate; during the dispensing of the drops, shifting a position of the stage or dispenser along the Y-dimension opposite to the first direction by an amount equal to the shift distance.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: January 4, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ecron D. Thompson, Craig William Cone, Logan L. Simpson, Wei Zhang, James W. Irving
  • Patent number: 11209730
    Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: December 28, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving
  • Publication number: 20210373437
    Abstract: A method of inspecting a dispenser including a faceplate comprises translating a sensor across the faceplate while measuring a distance between the sensor and the faceplate. The sensor is oriented such that a longitudinal axis of the sensor extends at an acute angle relative to a longitudinal axis of the faceplate. The method may include translating another sensor across the faceplate while measuring the same distance. Or the method may include another translating of the sensor across the faceplate while measuring the same distance. In either case, the sensor is oriented such that the longitudinal axis of the sensor extends at an obtuse angle relative to the longitudinal axis of the faceplate. The method includes determining, based on the measured distances, whether an amount of accumulated formable material on the surface of the faceplate is greater than a predetermined value.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 2, 2021
    Inventors: Craig William Cone, Steven C. Shackleton, Brent Andrew Snyder, James W. Irving, Brandyn L. Kinsey
  • Publication number: 20210181621
    Abstract: Imprinting methods and imprinting systems configured to cure formable material between a substrate and a template. With a first spatial light modulator with a first set of modulation elements configured to expose the formable material between the substrate and the template to a first pattern of actinic radiation; and a second spatial light modulator with a second set of modulation elements configured to expose the formable material between the substrate and the template to a second pattern of actinic radiation. At a plane of the formable material, a first set of centers of the first pattern associated with centers of the first set of modulation elements may be offset from a second set of centers of the second pattern associated with centers of the second set of modulation elements.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 17, 2021
    Inventors: Edward Brian Fletcher, James W. Irving, Nilabh K. Roy
  • Publication number: 20210132491
    Abstract: A fabrication method comprises selecting an initial drop pattern defining a position of drops of a formable material, the initial drop pattern comprising a grid pattern of drops, designating the drops of the grid pattern to be dispensed by a first series of nozzles of a dispenser based on a spacing between drops in the Y-dimension; generating a modified drop pattern by shifting the grid pattern in a first direction along the Y-dimension, wherein a shift distance is selected such that the drops of the shifted grid pattern are designated to be dispensed from a second series of nozzles of the dispenser; dispensing the plurality of drops according to the modified drop pattern onto a substrate; during the dispensing of the drops, shifting a position of the stage or dispenser along the Y-dimension opposite to the first direction by an amount equal to the shift distance.
    Type: Application
    Filed: October 31, 2019
    Publication date: May 6, 2021
    Inventors: Ecron D. Thompson, Craig William Cone, Logan L. Simpson, Wei Zhang, James W. Irving
  • Publication number: 20200292934
    Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 17, 2020
    Inventors: Logan L. Simpson, Steven Wayne Burns, Jason Battin, Niyaz Khusnatdinov, Christopher Ellis Jones, Craig William Cone, Wei Zhang, James W. Irving