Patents by Inventor James Word
James Word has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10354044Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: GrantFiled: June 7, 2017Date of Patent: July 16, 2019Assignee: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Publication number: 20170270235Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: ApplicationFiled: June 7, 2017Publication date: September 21, 2017Applicant: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Patent number: 9703922Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: GrantFiled: June 6, 2016Date of Patent: July 11, 2017Assignee: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Publication number: 20160283645Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: ApplicationFiled: June 6, 2016Publication date: September 29, 2016Applicant: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Patent number: 9361422Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: GrantFiled: October 21, 2013Date of Patent: June 7, 2016Assignee: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Publication number: 20140143741Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: ApplicationFiled: October 21, 2013Publication date: May 22, 2014Applicant: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Patent number: 8713487Abstract: After layout design data has been modified using a resolution enhancement process, a repair flow is initiated. This repair flow includes checking a layout design altered by a resolution enhancement process for errors. A repair process is performed to correct detected sub-resolution assist feature errors. The repair process may employ a rule-based sub-resolution assist feature technique, a model-based sub-resolution assist feature technique, an inverse lithography-based sub-resolution assist feature technique, or any combination thereof.Type: GrantFiled: January 9, 2013Date of Patent: April 29, 2014Assignee: Mentor Graphics CorporationInventors: James Word, Kyohei Sakajiri
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Patent number: 8566753Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: GrantFiled: December 17, 2010Date of Patent: October 22, 2013Assignee: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Publication number: 20110161894Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: ApplicationFiled: December 17, 2010Publication date: June 30, 2011Inventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Patent number: 7861207Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: GrantFiled: February 25, 2005Date of Patent: December 28, 2010Assignee: Mentor Graphics CorporationInventors: James Word, Nicolas B. Cobb, Patrick J. LaCour
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Patent number: 7493587Abstract: A system for creating mask layout pattern data in order to create a number of desired features on a semiconductor wafer. Critical features and features that are adjacent to or abut critical features are formed as phase shifting regions on a mask. Larger, non-critical features can be formed as annular rim shifters and may include one or more filling phase shifting regions. Non-critical features that are not adjacent to critical features and/or sub-resolution features that are not desired to print on the wafer can be formed as opaque or partially transparent regions on the mask.Type: GrantFiled: June 2, 2005Date of Patent: February 17, 2009Inventor: James Word
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Patent number: 7459248Abstract: A method for compensating for optical distortions occurring in regions associated with non-phase-shifting regions in a mask or reticle. OPC or other resolution enhancement techniques are performed on one or more edge segments associated with adjacent phase-shifting regions in order to compensate for edge position errors occurring in areas corresponding to non-phase-shifting regions.Type: GrantFiled: February 24, 2005Date of Patent: December 2, 2008Inventor: James Word
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Patent number: 7234130Abstract: A method and apparatus for compensating for flare intensity variations across an integrated circuit. A layout description for a physical layer of an integrated circuit or portion thereof is divided into a number of regions such as adjacent tiles. An estimate of the flare intensity in each region is determined. The flare intensity values calculated are divided into a number of ranges. In one embodiment, a data layer in a layout description is defined for each range of flare values computed. Features to be printed in an area having a flare value in a particular range are associated with a corresponding additional data layer. The features associated with each additional data layer are analyzed with a resolution enhancement technique that is selected or adjusted to compensate for differing flare values occurring in the integrated circuit.Type: GrantFiled: February 24, 2005Date of Patent: June 19, 2007Inventors: James Word, Nicolas B. Cobb, Yuri Granik
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Publication number: 20060199084Abstract: A system for creating mask layout pattern data in order to create a number of desired features on a semiconductor wafer. Critical features and features that are adjacent to or abut critical features are formed as phase shifting regions on a mask. Larger, non-critical features can be formed as annular rim shifters and may include one or more filling phase shifting regions. Non-critical features that are not adjacent to critical features and/or sub-resolution features that are not desired to print on the wafer can be formed as opaque or partially transparent regions on the mask.Type: ApplicationFiled: June 2, 2005Publication date: September 7, 2006Applicant: Mentor Graphics CorporationInventor: James Word
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Publication number: 20060188796Abstract: A method for compensating for optical distortions occurring in regions associated with non-phase-shifting regions in a mask or reticle. OPC or other resolution enhancement techniques are performed on one or more edge segments associated with adjacent phase-shifting regions in order to compensate for edge position errors occurring in areas corresponding to non-phase-shifting regions.Type: ApplicationFiled: February 24, 2005Publication date: August 24, 2006Inventor: James Word
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Publication number: 20050278686Abstract: A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.Type: ApplicationFiled: February 25, 2005Publication date: December 15, 2005Inventors: James Word, Nicolas Cobb, Patrick LaCour
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Publication number: 20050216878Abstract: A method and apparatus for compensating for flare intensity variations across an integrated circuit. A layout description for a physical layer of an integrated circuit or portion thereof is divided into a number of regions such as adjacent tiles. An estimate of the flare intensity in each region is determined. The flare intensity values calculated are divided into a number of ranges. In one embodiment, a data layer in a layout description is defined for each range of flare values computed. Features to be printed in an area having a flare value in a particular range are associated with a corresponding additional data layer. The features associated with each additional data layer are analyzed with a resolution enhancement technique that is selected or adjusted to compensate for differing flare values occurring in the integrated circuit.Type: ApplicationFiled: February 24, 2005Publication date: September 29, 2005Inventors: James Word, Nicolas Cobb, Yuri Granik
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Patent number: 5651590Abstract: A vehicle wheel including a wheel rim having a central axis and a plurality of generally parallel wheel discs extending across the wheel rim. The wheel discs are spaced axially apart and are generally perpendicular to the central axis. The wheel discs are permanently secured to the wheel rim.Type: GrantFiled: December 11, 1995Date of Patent: July 29, 1997Assignee: Hayes Wheels International, Inc.Inventor: James A. Word
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Patent number: 5647642Abstract: An automotive wheel having an outboard face presenting an asymmetric appearance and having a permanently fixed counterbalance weight near the outer periphery of the wheel to balance the wheel. The wheel disk has an asymmetric design which tends to statically and dynamically unbalance the wheel. A relatively light counterbalance weight is permanently fixed to the wheel during manufacture of the wheel. This counterbalance weight statically and dynamically balances the overall wheel.Type: GrantFiled: December 28, 1994Date of Patent: July 15, 1997Assignee: Hayes Wheels International, Inc.Inventor: James A. Word