Patents by Inventor Jamie Schaeffer

Jamie Schaeffer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11149886
    Abstract: A safety coupler for an air hose terminating in a plug. The plug has a passageway between its first and second ends for the passage of air there through. The coupler member has upstream and downstream ends and first body coupler passageway sized for receiving a first cylindrical section of the plug and terminating in a washer. A sleeve coupler and spring for biasing the sleeve coupler towards the coupler member upstream end, the sleeve coupler terminating at its coupler member upstream end by a bushing plug being sized to create a shoulder for abutting a raised stop of the plug.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: October 19, 2021
    Assignee: Plews, Inc.
    Inventors: Edward M. Edler, Jamie Schaeffer
  • Publication number: 20130299874
    Abstract: CMOS devices are enhanced by forming a recess in the positive channel for depositing SiGe. Embodiments include providing a positive channel region and a negative channel region in a silicon substrate for a CMOS device, with an STI region therebetween; removing a native oxide from above the positive channel region to expose a silicon substrate; forming a recess in the silicon substrate in the positive channel region adjacent the STI region; and depositing SiGe in the recess in the positive channel region, where an upper surface of the SiGe is substantially level with an upper surface of the negative channel region.
    Type: Application
    Filed: May 10, 2012
    Publication date: November 14, 2013
    Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
    Inventors: Joanna Wasyluk, Berthold Reimer, Carsten Reichel, Jamie Schaeffer, Yew Tuck Chow, Stephan Kronholz, Andreas Ott
  • Publication number: 20070284677
    Abstract: A metal-oxide-semiconductor (MOS) transistor having a gate electrode comprising a metal oxynitride and a method of forming the same are provided. The metal oxynitride preferably comprises molybdenum oxynitride and/or iridium oxynitride. The gate electrode may further comprise carbon and/or silicon. The gate electrode is preferably formed in a chamber containing nitrogen, oxygen and a carbon-containing gas. The gate electrode of the MOS transistor has a high work function and a low equivalent oxide thickness.
    Type: Application
    Filed: April 26, 2007
    Publication date: December 13, 2007
    Inventors: Weng Chang, Boq-Kang Hu, Jamie Schaeffer, David C. Gilmer, Phil Tobin