Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Abstract: A container (1) for accommodating an ophthalmic lens during a lens treatment process has a longitudinal axis (11) and comprises as separate elements a containment element (2), a mounting element (3), and a retaining element (4). The containment element (2) comprises a tubular section (21) and a bottom (22) arranged at a distal end of the tubular section (21), the bottom (22) protruding convexly towards the outside at the distal end of the tubular section (21) and being provided with a number of apertures (23, 24), the tubular section (21) at a proximal end (25) thereof having a latch (26) protruding from the proximal end (25) of the tubular section (21) towards the mounting element (3). The mounting element (3) comprises a sidewall (31) extending along the longitudinal axis (11) of the container (1), the sidewall (31) being provided with recesses or orifices (32) which are in engagement with the latch (26) of the containment element (2).

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract: A lens mold carrier (1; 2) comprises: a frame (10; 20) extending in a plane (x,y; u,v) and comprising a plurality of individual compartments (100; 200); at least one mold unit (11; 21) arranged in one of the individual compartments (100; 200) in a manner secured against falling out, the at least one mold unit (11; 21) including an adapter piece (110; 210) and a lens mold (112; 212) fixedly connected to the adapter piece (110; 210). The adapter piece (110; 210) is floatingly arranged within the compartment (100; 200) to allow for limited movement of the adapter piece (110; 210) within the compartment (100; 200) at least in a translation plane parallel to or coincident with the plane (x,y; u,v) in which the frame (10; 20) extends.

Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

Abstract: A container (1) for accommodating an ophthalmic lens during a lens treatment process has a longitudinal axis (11) and comprises as separate elements a containment element (2), a mounting element (3), and a retaining element (4). The containment element (2) comprises a tubular section (21) and a bottom (22) arranged at a distal end of the tubular section (21), the bottom (22) protruding convexly towards the outside at the distal end of the tubular section (21) and being provided with a number of apertures (23, 24), the tubular section (21) at a proximal end (25) thereof having a latch (26) protruding from the proximal end (25) of the tubular section (21) towards the mounting element (3). The mounting element (3) comprises a sidewall (31) extending along the longitudinal axis (11) of the container (1), the sidewall (31) being provided with recesses or orifices (32) which are in engagement with the latch (26) of the containment element (2).

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.

Abstract: A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

Abstract: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.

Abstract: A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface.

Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.