Abstract: An aircraft sink water heater includes an electric heater with coils engaging water tube coils. The system quickly heats a small volume of water in the tube coils, sufficient to wash a user's hands.

Abstract: A system and method for lifting and lowering an object such as a vehicle, comprising: at least two lifting columns; communication means for communication with the at least two lifting columns; position-determining means for carrying out a position determination for each of the at least two lifting columns; selection means for selecting at least one of the lifting columns on the basis of the position determinations; and at least one control unit co-acting with the communication means during use for the purpose of controlling the lifting columns selected with the selection means.

Abstract: A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.

Abstract: Method of handling a substrate support structure for clamping a substrate on a surface thereof in a lithography system. First, a substrate support structure adapted to absorb energy from a substrate clamped thereon and a substrate are provided. The substrate is clamped on a surface of the substrate support structure. The substrate support structure with the substrate clamped thereon is transferred to a lithography apparatus, in which a lithographic process is performed on the substrate clamped onto the substrate support structure. The substrate support structure with the substrate clamped thereon is then removed from the lithography system. The substrate is removed from the substrate support structure, and the substrate support structure is conditioned by removing energy stored in the substrate support structure before providing a new substrate onto the substrate support structure.

Abstract: A tea maker (100) comprising a power base (300) including an upper portion that provides for a user interface (360) and for a vessel reception location (361), which location is adapted to receive a vessel (200) that is detachable from the power base, wherein the user interface (360) includes an illuminable brewing progress indicator (368) that extends at least partially around said vessel reception location, such that at least a portion of the brewing progress indicator is visible from any position around the power base when the vessel is present at said vessel reception location; and a controller (332) that is configured to control the brewing progress indicator (368) during a tea brewing process, such that a user is notified of progress in said process by a change in illumination of the brewing progress indicator.

Abstract: A tea maker (100) comprising a user interface panel (360), including: a layer of wood (359), having a front side and a back side, and being provided with one or more thin, and therefore translucent,portions; and a transparent body (354), having a front side and a back side, said front side being provided against the back side of the layer of wood. The tea maker further comprises illumination means (322, 324, 328), disposed at the back side of the transparent body, and configured to emit light through the transparent body (354) and onto the translucent portions of the layer of wood (359), so as to make said translucent portions light up on the front side of said layer of wood.

Abstract: A substrate support structure for clamping a substrate on a surface by means of a capillary layer of a liquid. The surface has an outer edge and includes one or more substrate supporting elements for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure circumscribing the surface and having a top surface or edge forming a sealing rim. A distance between the outer edge of the surface and an outermost of the support locations is greater than a distance between the outer edge and the sealing rim.

Abstract: The invention relates to a method of compensating sub-array or element failure in a phased array radar system. The method comprises the step of defining a virtual array comprising a multiple number of virtual transceiver tiles preferably arranged halfway all connection lines interconnecting a transmitter tile to a receiver tile. Further, the method comprises the steps of performing phased array radar measurements, and estimating radar data associated with a first transmitter/receiver combination by using radar data associated with a second transmitter/receiver combination, wherein the virtual transceiver tile of the first transmitter/receiver combination substantially coincides with the virtual transceiver tile of the second transmitter/receiver combination.

Abstract: A charged particle lithography system comprising a preparation unit. The preparation unit comprises a housing having a first load port for loading and/or unloading a substrate into or out of the housing, a substrate transfer unit for locating the substrate onto a substrate support structure within the housing, and a second load port for loading and/or unloading the substrate support structure supporting the substrate.

Abstract: A nodal-mounted spring arrangement for an electronic toothbrush includes a V-shaped spring member secured at both ends so that it can operate in out-of-phase torsion mode along the axial dimension thereof. A mounting plate is connected between a node point along the V-shaped spring member and the housing of the toothbrush. In one embodiment, the V-shaped spring member includes opposing slots on opposite sides of the node point, the slots extending in an axial direction, creating an integrated torsion bar node spring, while reducing stress in the vicinity of the nodal point.

Abstract: An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.

Abstract: A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N?1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.

Abstract: A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.

Abstract: Provided is a system, lifting column and method for the energy efficient lifting and lowering of a load, such as a vehicle. The system includes a lifting column having a frame with a movable carrier and a drive which acts on the carrier. The drive includes a power source for power supply to a motor, a pump in an ascent mode driven by the motor and in a decent mode driving the motor as a generator for energy-recovery, and motor control unit for control of the motor. The motor control unit is arranged such that the power supply of the motor is manipulated for speed control of the carrier in at least the ascent mode.

Abstract: System for lifting and lowering a load, such as a vehicle, with at least one lifting mechanism such as a lifting column, a boom lift, a scissor lift and a loading platform. The lifting mechanism includes a carrier which can be moved up and downward for bearing the load and a drive which acts on the carrier. The drive herein includes at least one electrical power source and an electric motor to be energized at least during ascending of the carrier, and the electric motor forms a generator to be connected to the power source at least during even an unloaded descending movement of the carrier for the purpose of gene rating electrical energy to the power source.

Abstract: The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.

Abstract: A substrate support structure for clamping a substrate on a surface by means of a capillary layer of a liquid. The surface has an outer edge and includes one or more substrate supporting elements for receiving the substrate to be clamped, wherein the one or more substrate supporting elements are arranged to provide support for the substrate at a plurality of support locations. The substrate support structure further includes a sealing structure circumscribing the surface and having a top surface or edge forming a sealing rim. A distance between the outer edge of the surface and an outermost of the support locations is greater than a distance between the outer edge and the sealing rim.

Abstract: Disclosed are a device and method for blocking a vehicle, and a loading-unloading station provided with such a device. The device includes a guide track disposed along a driveway; a carriage guided by the guide track and provided with a blocking means for blocking a wheel of a vehicle; a locking member provided on the carriage for locking the carriage releasably relative to the guide track; displacing means for displacing the carriage from a first rest position for the blocking means to a second blocking position, wherein the displacing means are provided with an energy storage system such that energy supplied by the vehicle can be used to displace the carriage; and releasing means operatively connected to the displacing means for releasing the carriage such that it follows a wheel of a vehicle as soon as this passes the first position.

Abstract: An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber. The arrangement further comprises a common robot for conveying wafers to the plurality of lithography apparatuses, and a wafer load unit for each charged particle lithography apparatus arranged at a front side of each respective vacuum chamber. The plurality of lithography apparatuses are arranged in a row with the front side of the lithography apparatuses facing an aisle accommodating passage of the common robot for conveying wafers to each apparatus, and the rear side of each lithography apparatus faces an access corridor, and the back wall of each vacuum chamber is provided with an access door for access to the respective lithography apparatus.

Abstract: A bottle warmer and mixing apparatus comprises a mixing unit (50) arranged to agitate a bottle (3) to mix contents therein. A heating unit is arranged to heat the contents of the bottle. The heating unit is at least partially decoupled from the agitation generated by the mixing unit (50).