Patents by Inventor Jan Frederik Hoogkamp
Jan Frederik Hoogkamp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9500953Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation.Type: GrantFiled: November 2, 2012Date of Patent: November 22, 2016Assignee: ASML Netherlands B.V.Inventors: Jan Frederik Hoogkamp, Bastiaan Stephanus Hendricus Jansen, Maurice Willem Jozef Etiënne Wijckmans
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Publication number: 20150261095Abstract: A radiation source suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location. The radiation source is configured to receive a first amount of radiation such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location, and such that, in use, the first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation. The radiation source further comprises a first sensor arrangement configured to measure a property of the first amount of radiation that is indicative of a focus position of the first amount of radiation; and a second sensor arrangement configured to measure a property of a fuel droplet that is indicative of a position of the fuel droplet.Type: ApplicationFiled: September 6, 2012Publication date: September 17, 2015Applicant: ASML Netherlands B.V.Inventors: Bastiaan Stephanus Hendricus Jansen, Jan Frederik Hoogkamp
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Publication number: 20140333915Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation.Type: ApplicationFiled: November 2, 2012Publication date: November 13, 2014Applicant: ASML Netherlands B.V.Inventors: Jan Frederik Hoogkamp, Bastiaan Stephanus Hendricus Jansen, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 7878755Abstract: A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.Type: GrantFiled: February 1, 2008Date of Patent: February 1, 2011Assignee: ASML Netherlands B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen
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Patent number: 7576831Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.Type: GrantFiled: March 11, 2004Date of Patent: August 18, 2009Assignee: ASML Netherlands B.V.Inventors: Pieter Johannes Marius Van Groos, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen, Albert Jan Hendrik Klomp, Johannes Petrus Martinus Bernardus Vermeulen, Erik Roelof Loopstra
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Patent number: 7486384Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.Type: GrantFiled: March 31, 2004Date of Patent: February 3, 2009Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Johannes Van Meer, Patrick Johannes Cornelus Hendrik Smulders, Franciscus Andreas Cornelis Johannes Spanjers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
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Publication number: 20080297758Abstract: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.Type: ApplicationFiled: June 26, 2008Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Edwin Johan Buis, Sjoerd Nicolaas Lambertus Donders, Jan Van Elp, Jan Frederik Hoogkamp, Aschwin Lodewijk Hendricus Van Meer, Patrick Johannes Cornelus Smulders, Franciscus Andreas Cornelis Spanjers, Johannes Petrus Martinus Ber Vermeulen, Raimond Visser, Henricus Gerardus Tegenbosch, Johannes Charles Adrianus Van Den Berg, Henricus Johannes Adrianus Van De Sande, Thijs Vervoort
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Patent number: 7459701Abstract: A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.Type: GrantFiled: June 8, 2005Date of Patent: December 2, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Jan Frederik Hoogkamp, Albert Johannes Maria Jansen, Jan-Jaap Kuit, Peter Schaap, Joep Janssen, Hubrecht Bastiaan Jasperse, Arjan Martin Van Der Wel
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Patent number: 7408615Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: June 21, 2004Date of Patent: August 5, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7394520Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.Type: GrantFiled: March 11, 2004Date of Patent: July 1, 2008Assignee: ASML Netherlands B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Raimond Visser, Josephus Cornelius Johannes Antonius Vugts, Henricus Johannes Louis Marie Vullings, Leo Wilhelmus Maria Kuipers, Johannes Hendrikus Gertrudis Franssen
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Patent number: 7394525Abstract: The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.Type: GrantFiled: October 21, 2004Date of Patent: July 1, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Jan Frederik Hoogkamp, Hubert Marie Segers, Raimond Visser, Johannes Maquine
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Publication number: 20080138177Abstract: A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.Type: ApplicationFiled: February 1, 2008Publication date: June 12, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen
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Patent number: 7359031Abstract: Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.Type: GrantFiled: March 11, 2004Date of Patent: April 15, 2008Assignee: ASML Netherlands B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen
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Patent number: 7349067Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: July 16, 2004Date of Patent: March 25, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7345736Abstract: A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.Type: GrantFiled: August 27, 2004Date of Patent: March 18, 2008Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Petrus Rutgerus Bartray, Dirk Jan Bijvoet, Jan Frederik Hoogkamp
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Patent number: 7131999Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.Type: GrantFiled: September 28, 2004Date of Patent: November 7, 2006Assignee: ASML Netherlands B.V.Inventors: Jan Frederik Hoogkamp, Jan Jaap Kuit, Raimond Visser
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Patent number: 7123349Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.Type: GrantFiled: March 11, 2004Date of Patent: October 17, 2006Assignee: ASML Netherlands B.V.Inventors: Pieter Johannes Marius Van Groos, Pieter Renaat Maria Hennus, Jan Frederik Hoogkamp, Albert Jan Hendrik Klomp, Johannes Onvlee, Raimond Visser
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Patent number: 7106420Abstract: The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support.Type: GrantFiled: December 20, 2004Date of Patent: September 12, 2006Assignee: ASML Netherlands B.V.Inventors: Jan Jaap Kuit, Dirk Jan Bijvoet, Jan Frederik Hoogkamp, Hubert Marie Segers, Raimond Visser, Johannes Maquine
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Publication number: 20060066832Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.Type: ApplicationFiled: September 28, 2004Publication date: March 30, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Jan Frederik Hoogkamp, Jan Jaap Kuit, Raimond Visser
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Publication number: 20040263823Abstract: Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.Type: ApplicationFiled: March 11, 2004Publication date: December 30, 2004Applicant: ASML Netherlands B.V.Inventors: Albert Jan Hendrik Klomp, Jan Frederik Hoogkamp, Josephus Cornelius Johannes Antonius Vugts, Robert Gordon Livesey, Johannes Hendrikus Gertrudis Franssen