Patents by Inventor Jan-Gerard Cornelis Van Der Toorn
Jan-Gerard Cornelis Van Der Toorn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110188015Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: ApplicationFiled: April 11, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Roelof Frederik DE GRAAF, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Publication number: 20110181859Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: ApplicationFiled: April 7, 2011Publication date: July 28, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Publication number: 20110183257Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: April 8, 2011Publication date: July 28, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes CORNELISSEN, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Hernes JACOBS, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Bob STREEFKERK, Jan-Gerard Cornelis VAN DER TOORN, Peter SMITS, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
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Patent number: 7936444Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: GrantFiled: February 7, 2008Date of Patent: May 3, 2011Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Publication number: 20110090474Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: December 29, 2010Publication date: April 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7929112Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: GrantFiled: November 17, 2008Date of Patent: April 19, 2011Assignee: ASML Netherlands B.V.Inventors: Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Patent number: 7928407Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 22, 2006Date of Patent: April 19, 2011Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7859644Abstract: A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.Type: GrantFiled: December 17, 2007Date of Patent: December 28, 2010Assignee: ASML Netherlands B.V.Inventors: Jan-Gerard Cornelis Van Der Toorn, Hans Butler, Henrikus Herman Marie Cox, Evert Hendrik Jan Draaijer, Nicolaas Ten Kate, Frits Van Der Meulen, Mark Johannes Hermanus Frencken, Martijn Houkes, Antonius Henricus Arends, Minne Cuperus
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Patent number: 7817243Abstract: A vibration isolation system isolates a body from its surroundings with respect to vibrations. The vibration isolation system includes active isolator devices that isolate and damp the body in unstable directions. However, such active isolators may exert damping forces not only in the unstable direction, but simultaneously in other stable directions due to mechanical coupling of the stable and unstable directions. As a result the damping and isolation in the other stable directions may be deteriorated due to the active isolation and damping. Employing modal decoupling, i.e. decomposing any vibration into independent directions, and isolating and damping in the independent directions, enables compensation of any vibration in an unstable direction without influencing the isolation and damping performance in any other, possibly stable, direction.Type: GrantFiled: April 12, 2004Date of Patent: October 19, 2010Assignee: ASML Netherlands B.V.Inventors: Marcel François Heertjes, Jan-Gerard Cornelis Van Der Toorn
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Patent number: 7751032Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.Type: GrantFiled: June 16, 2008Date of Patent: July 6, 2010Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan-Gerard Cornelis Van Der Toorn
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Publication number: 20100149514Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: March 1, 2010Publication date: June 17, 2010Applicants: ASML Netherlands B.V., ASML Holding NVInventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 7701550Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: August 19, 2004Date of Patent: April 20, 2010Assignees: ASML Netherlands B.V., ASML Holding NVInventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 7633073Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 23, 2005Date of Patent: December 15, 2009Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen, Bob Streefkerk
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Publication number: 20090303455Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 14, 2009Publication date: December 10, 2009Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens
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Patent number: 7630059Abstract: A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feedforward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feedforward correction signal to be fed to the stage.Type: GrantFiled: July 24, 2006Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes, Wilhelmus Franciscus Johannes Simons
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Patent number: 7602470Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: August 29, 2005Date of Patent: October 13, 2009Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christian Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20090115984Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.Type: ApplicationFiled: January 7, 2009Publication date: May 7, 2009Applicant: ASML NETHERLANDS B.V.Inventors: HANS JANSEN, PATRICIUS ALOYSIUS JACOBUS TINNEMANS, JAN-GERARD CORNELIS VAN DER TOORN
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Publication number: 20090073408Abstract: Lithographic Apparatus and Device Manufacturing Method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: ApplicationFiled: November 17, 2008Publication date: March 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Patent number: 7468779Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: GrantFiled: June 28, 2005Date of Patent: December 23, 2008Assignee: ASML Netherlands B.V.Inventors: Roelof Frederik De Graaf, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Publication number: 20080252866Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.Type: ApplicationFiled: June 16, 2008Publication date: October 16, 2008Applicant: ASML Netherlands B.V.Inventors: Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Jan-Gerard Cornelis Van Der Toorn