Patents by Inventor Jan Johannes Van Den Broek
Jan Johannes Van Den Broek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7260822Abstract: The optical data storage medium (20) has a substrate (1) with a surface area having tracks (4) of marks representing stored information. The information is readable by means of a scanning radiation beam (10). A reflective layer (2) is present, reflecting the radiation beam (10). The medium has a radiation beam (10) reflection larger than 50%. The reflective layer (2) comprises a compound of the formula Al100-y,Xy, in which formula Al is aluminum and X is an element selected from the group of Ge and Si. The letter y is the atomic fraction of X in at. %. The value of y is in the range 5<y<35. The reflective layer (2) has a radiation beam absorption, which enables controlled ablative recording or solid-phase change recording of an identification mark (6, 6?).Type: GrantFiled: June 4, 2002Date of Patent: August 21, 2007Assignee: Koninklijke Philips Electronics N.V.Inventors: Johannes Cornelis Norbertus Rijpers, Jan Johannes Van Den Broek, Hermanus Henricus Josephus Wilting, Roel Van Woudenberg
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Publication number: 20040148623Abstract: The optical data storage medium (20) has a substrate (1) with a surface area having tracks (4) of marks representing stored information. The information is readable by means of a scanning radiation beam (10). A reflective layer (2) is present, reflecting the radiation beam (10). The medium has a radiation beam (10) reflection larger than 50%. The reflective layer (2) comprises a compound of the formula Al100-y,Xy, in which formula Al is aluminum and X is an element selected from the group of Ge and Si. The letter y is the atomic fraction of X in at. %. The value of y is in the range 5<y<35. The reflective layer (2) has a radiation beam absorption, which enables controlled ablative recording or solid-phase change recording of an identification mark (6, 6′).Type: ApplicationFiled: December 3, 2003Publication date: July 29, 2004Inventors: Johannes Cornellis Norbertus Rijpers, Jan Johannes Van Den Broek, Hermanus Henricus Josephus Wilting, Roel Van Woudenberg
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Patent number: 6764953Abstract: The electronic device (1) has a layer (11) of a material comprising a first and a second element. This material has an amorphous and a crystalline state. A transition from the amorphous to the crystalline state can be effected by heating of the material to above a crystallization temperature, for example with a laser. As a result, the layer (11) has a first electrically conducting areas (21), comprising the material in the crystalline state, which are insulated from each other by the first electrically insulating area (23), comprising the material in the amorphous state. The layer (11) may be present as an interconnect layer, but also as a covering layer. Preferably, the material is aluminum-germanium. In the method of patterning a layer (11), electrically conductive areas of the layer can be strengthened by electroplating.Type: GrantFiled: November 18, 2002Date of Patent: July 20, 2004Assignee: Koninklijke Philips Electronics N.V.Inventors: Jan Johannes Van Den Broek, Coen Theodorus Hubertus Fransiscus Liedenbaum, Andreas Hubertus Montree, Arjen Boogaard, Willem Reindert De Wild, Johannes Nicolaas Huiberts
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Publication number: 20030118751Abstract: The electronic device (1) has a layer (11) of a material comprising a first and a second element. This material has an amorphous and a crystalline state. A transition from the amorphous to the crystalline state can be effected by heating of the material to above a crystallization temperature, for example with a laser. As a result, the layer (11) has a first electrically conducting areas (21), comprising the material in the crystalline state, which are insulated from each other by the first electrically insulating area (23), comprising the material in the amorphous state. The layer (11) may be present as an interconnect layer, but also as a covering layer. Preferably, the material is aluminum-germanium. In the method of patterning a layer (11), electrically conductive areas of the layer can be strengthened by electroplating.Type: ApplicationFiled: November 18, 2002Publication date: June 26, 2003Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Jan Johannes Van Den Broek, Coen Theodorus Hubertus Fransiscus Liedenbaum, Andreas Hubertus Montree, Arjen Boogaard, Willem Reindert De Wild, Johannes Nicolaas Huiberts
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Patent number: 6529116Abstract: The passive component (1) has a first part (22) of a material with a first resistance value, which value can be lowered to a second value by laser trimming. The second value is at most one tenth of the first value and preferably less. The material crystallizes in a laser trimming process, which locally heats the material to at least a transition temperature. The material contains at least two different elements, which are preferably aluminum and germanium. The passive component (1) may be, for example, a resistor or a capacitor and may be part of a thin-film network of resistors, capacitors and/or inductors. In a resistor, it is preferred to have a second part (4) which contains a different resistance material with a resistance value lower than the first value and preferably higher than the second value.Type: GrantFiled: May 30, 2001Date of Patent: March 4, 2003Assignee: Koninklijke Philips Electronics N.V.Inventors: Jan Johannes Van Den Broek, Arjen Boogaard, Richard Antonius Fransiscus Van Der Rijt, Martinus Hermanus Wilhelmus Maria Van Delden, Willem Reindert De Wild, Andreas Hubertus Montree
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Patent number: 6509650Abstract: The electronic device (1) has a layer (11) of a material comprising a first and a second element. This material has an amorphous and a crystalline state. A transition from the amorphous to the crystalline state can be effected by heating of the material to above a crystallization temperature, for example with a laser. As a result, the layer (11) has a first electrically conducting areas (21), comprising the material in the crystalline state, which are insulated from each other by the first electrically insulating area (23), comprising the material in the amorphous state. The layer (11) may be present as an interconnect layer, but also as a covering layer. Preferably, the material is aluminum-germanium. In the method of patterning a layer (11), electrically conductive areas of the layer can be strengthened by electroplating.Type: GrantFiled: June 1, 2001Date of Patent: January 21, 2003Assignee: Koninklijke Philips Electronics N.V.Inventors: Jan Johannes Van Den Broek, Coen Theodorus Hubertus Franciscus Liedenbaum, Andreas Hubertus Montree, Arjen Boogaard, Willem Reindert De Wild, Johannes Nicolaas Huiberts
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Publication number: 20020036334Abstract: The passive component (1) has a first part (22) of a material with a first resistance value, which value can be lowered to a second value by laser trimming. The second value is at most one tenth of the first value and preferably less. Said material crystallizes in a laser trimming process, which locally heats the material to at least a transition temperature. Said material contains at least two different elements, which are preferably aluminum and germanium.Type: ApplicationFiled: May 30, 2001Publication date: March 28, 2002Inventors: Jan Johannes Van Den Broek, Arjen Boogaard, Richard Antonius Fransiscus Van Der Rijt, Martinus Hermanus Wilhelmus Maria Van Delden, Willem Reindert De Wild, Andreas Hubertus Montree
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Publication number: 20020008236Abstract: The electronic device (1) has a layer (11) of a material comprising a first and a second element. This material has an amorphous and a crystalline state. A transition from the amorphous to the crystalline state can be effected by heating of the material to above a crystallization temperature, for example with a laser. As a result, the layer (11) has a first electrically conducting areas (21), comprising the material in the crystalline state, which are insulated from each other by the first electrically insulating area (23), comprising the material in the amorphous state. The layer (11) may be present as an interconnect layer, but also as a covering layer. Preferably, the material is aluminum-germanium. In the method of patterning a layer (11), electrically conductive areas of the layer can be strengthened by electroplating.Type: ApplicationFiled: June 1, 2001Publication date: January 24, 2002Applicant: Koninklijke Philips Electronics N.V.Inventors: Jan Johannes Van Den Broek, Coen Theodorus Hubertus Fransiscus Liedenbaum, Andreas Hubertus Montree, Arjen Boogaard, Willem Reindert De Wild, Johannes Nicolaas Huiberts