Patents by Inventor Jan Wietse Ricolt Ten Cate

Jan Wietse Ricolt Ten Cate has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography apparatus
    Patent number: 7061583
    Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: June 13, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Johannesq Catharinus Hubertus Mulkens, Gavin Charles Rider, Jan Wietse Ricolt Ten Cate
  • Lithography apparatus
    Publication number: 20040051858
    Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
    Type: Application
    Filed: August 15, 2003
    Publication date: March 18, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Johannesq Catharinus Hubertus Mulkens, Gavin Charles Rider, Jan Wietse Ricolt Ten Cate
  • Lithography apparatus
    Publication number: 20020167653
    Abstract: An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
    Type: Application
    Filed: June 24, 2002
    Publication date: November 14, 2002
    Applicant: ASML Netherlands B.V.
    Inventors: Johannesq Catharinus Hubertus Mulkens, Gavin Charles Rider, Jan Wietse Ricolt Ten Cate
  • Lithography apparatus
    Patent number: 6452662
    Abstract: An illumination system for a microlithographic exposure apparatus comprised of an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
    Type: Grant
    Filed: April 6, 1999
    Date of Patent: September 17, 2002
    Assignee: ASML Netherlands B.V.
    Inventors: Johannesq Catharinus Hubertus Mulkens, Gavin Charles Rider, Jan Wietse Ricolt Ten Cate