Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Abstract: A coffee machine (1) for providing coffee brew with reduced caffeine content is disclosed. The coffee machine (1) comprises a mixer (8) for mixing coffee grind (19) and a caffeine-reducing additive (20), the mixer having a coffee inlet (14) for receiving the coffee grind (19), an additive inlet (18) for receiving the caffeine-reducing additive (20), and a mixer outlet (21) for providing a mixture (22) of coffee grind and additive, and a brewing unit (5) for brewing the mixture (22) of coffee grind and additive, the brewing unit (5) having a brewing unit inlet (23) and a brewing unit outlet (24) for providing coffee brew, wherein the brewing unit inlet (23) of the brewing unit (5) is connected to the mixer outlet (21) of the mixer (8) for receiving the mixture (22) of coffee grind and additive. Furthermore, a corresponding method and a replaceable cartridge containing a caffeine-reducing additive are presented.

Abstract: A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41?) after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.

Abstract: A phase change material for use in a phase change memory device comprises germanium-antimony-tellurium-indium, wherein the phase change material comprises in total more than 30 at % antimony, preferably 5-16 at % germanium, 30-60 at % antimony, 25-51 at % tellurium, and 2-33% at % indium.

Abstract: A phase change material for use in a phase change memory device comprises germanium-antimony-tellurium-indium, wherein the phase change material comprises in total more than 30 at % antimony, preferably 5-16 at % germanium, 30-60 at % antimony, 25-51 at % tellurium, and 2-33% at % indium.

Abstract: A press for agricultural crop mainly comprising a frame (1), a baling chamber (4) with an inlet opening carried by said frame, a pressing member (5) driven so as to reciprocate in the baling chamber (4), said baling chamber (4) being provided with means for producing a counter-pressure in order to form a bale of compressed agricultural crop, wherein the means for producing the counter-pressure comprise an outlet part (15) prolonging the baling chamber (4) and narrowing in the pressing direction and a removable flap member (31) partly or wholly closing the passage near the transition area between baling chamber (4) and outlet part (15), in order to produce a counter-pressure at the start so that even the first or second bale has sufficient density.

Abstract: A device for overhead dusting of a field with fertilizer or particulate material includes an overhead suction impeller having a central annulus receiving a vertical pipe leading from a flow-controlled hoppr discharge. A cover on the pipe confines the discharge of air and entrained material to an angular section of the annulus and a baffle is adjustable around the pipe to increase and decrease the angular section.

Abstract: A so-called round baler has baling and wrapping chambers (3, 4), defined in part by flexible endless belts (1, 2). A bale formed in the chamber (3) may be transferred to the chamber (4) after separating the juxtaposed portions (12, 22) of working runs of the belt (FIG. 5).

Abstract: A driven transverse spreader forcibly spreads a windrow to be uniformly distributed in front of a crop pick-up device. Flexible aprons at the sides of the device prevent transverse spreading beyond the grasp of the pick-up device.

Abstract: A roll baling device in where the hay is picked up and formed by a group of guiding and stretching members for endless belt-like elements arranged between and supported by two relatively spaced walls. A further group of cylindrical support elements are arranged in a substantially complete circle within the baling chamber and cooperate with the belts to limit the diameter of the round bale in accord with the diameter of the circle.