Abstract: A lens design having two concave mirrors or Mangins and a turning mirror is disclosed. The optical axis of the concave elements are approximately coplanar and intersect on a turning mirror, and the normal to the surface of the turning mirror bisects the angle between the two optical axis.

Abstract: A lens design having two concave mirrors or Mangins and a turning mirror is disclosed. The optical axis of the concave elements are coplanar and intersect on a turning mirror, and the normal to the surface of the turning mirror bisects the angle between the two optical axis.

Abstract: A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.

Abstract: A three dimensional packaging architecture for ultimate high performance computers and methods for fabricating thereof are described. The package allows very dense packaging of multiple integrated circuit chips for minimum communication distances and maximum clock speeds of the computer. The packaging structure is formed from a plurality of subassemblies. Each subassembly is formed from a substrate which has on at least one side thereof at least one integrated circuit device. Between adjacent subassemblies there is disposed a second substrate. There are electrical interconnection members to electrically interconnect contact locations on the subassembly to contact locations on the second substrate. The electrical interconnection members can be solder mounds, wire bonds and the like. The first substrate provides electrical signal intercommunication between the electronic devices and each subassembly. The second substrate provides ground and power distribution to the plurality of subassemblies.

Abstract: An electronic package having an active cooling system for maintaining a semiconductor chip at approximately a constant temperature by monitoring the present temperature of the chip and varying the air flow over a heat sink in thermal contact with the chip in response to the temperature. In addition, the temperature difference between the semiconductor chip module and a printed circuit board is also monitored to maintain that difference at a preset value. The air flow is varied by a variable speed fan or a variable direction baffle.

Abstract: A lens system for a laser scanning apparatus which incorporates two transfer lenses in tandem. The transfer lenses include angular reflecting mirrors, correction lenses, and concave mirrors. The transfer lenses are located between the projection mask and the target of the scanning apparatus wherein the laser beam passed through the projection mask is reflected by an angularly disposed mirror through the first correction lens onto the first concave mirror where it is reflected back through the first correction lens and onto another angularly disposed mirror where the beam is sent to and back from the second concave mirror through the second correction lens and then onto the target.

Abstract: Structure is disclosed for the ablation of material by the use of a laser beam wherein the laser provides a beam which is directed through an illumination and projection optical system for imaging on the material which is to be ablated. In the present invention the peak power of the laser beam is adjustable. The laser beam peak power adjustment structure includes a laser that provides a pulsed beam. The laser beam is directed into a beam splitter wherein the laser beam is split into two beam components. The first beam component passes through beam splitter with negligible or no delay, then passes through a quarter waveplate and impinges on a first mirror which reflects it back to the beam splitter. The second beam component is directed at an angle of 90 degrees by the beam splitter and toward a second mirror. The second mirror is at a predetermined distance from the beam splitter which introduces a total predetermined delay for the reflected second beam component as it is directed back to the beam splitter.

Abstract: A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.

Abstract: An optical system of a NX reduction catadioptric relay lens having sub-half micron resolution over the ultraviolet band width is described. A spherical mirror with a stop at the mirror is used to work at substantially the desired reduction ratio and the desired high numerical aperture sufficient to provide the desired high resolution. A beam splitting cube with appropriate coatings is used to form an accessible image of an object on an image plane. Refracting correctors in the path of the slow beam incident on the mirror and in the path of the fast beam reflected on the mirror are designed to fix the aberrations of the image formed by the mirror.

Abstract: An optical system having a plurality of substantially planar reflecting surfaces and a plurality of curved reflecting surfaces providing an optical projection system which can scan a mask object onto an image plane by having the mask and copy substrate substantially fixed in position relative to each other and either simultaneously moving the mask and copy substrate in the same direction or maintaining the mask and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask to the copy substrate and another wavelength of electromagnetic radiation to form the image of the mask on the copy substrate. The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask onto the copy substrate, as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.

Abstract: An optical system of a NX reduction catadioptric relay lens having sub-half micron resolution over the utlraviolet band width is described. A spherical mirror with a stop at the mirror is used to work at substantially the desired reduction ratio and the desired high numerical aperture sufficient to provide the desired high resolution. A beam splitting cube with appropriate coatings is used to form an accessible image of an object on an image plane. Refracting correctors in the path of the slow beam incident on the mirror and in the path of the fast beam reflected on the mirror are designed to fix the aberrations of the image formed by the mirror.

Abstract: An optical system having a substantially flat image field is disclosed. The optical system is formed from optical subsystems wherein an input optical subsystem forms an intermediate image has a curvature which compensates that from the remaining optical components of the system to result in a substantially flat image for the optical system. Preferably the optical elements preceding the intermediate image and the optical elements succeeding the intermediate image are separately corrected for odd aberrations. The optical elements preceding the intermediate image and the optical elements succeeding the intermediate image compensate for each other and result in a substantially aberration free flat image for the optical system. The optical system preferably contains an input optical subsystem and an output optical subsystem wherein the input optical subsystem is a catadioptric system and wherein the output optical system is a dioptric system.

Abstract: A process for hermetically sealing defects in a porous ceramic substrate comprising the steps of evaporating or sputtering a malleable metal layer onto the defective porous ceramic surface, swaging or smearing the malleable metal layer over the defects and depositing a second metal film over the swaged first film to provide a smooth defect free surface.

Abstract: A system of establishing a conductive via path between spaced interlevel conductors. Successive layers of metallization separated by a dielectric are built. The vias are opened in one step to eliminate interlevel mashing. The system employs annular pads at locations where contact may be established to another wiring level. The vias are self-aligned and taper from top metal to first level contact. The system is applicable both chip-wise and carrier-wise.

Abstract: A coherent laser beam having a possibly non-uniform spatial intensity distribution is transformed into an incoherent light beam having a substantially uniform spatial intensity distribution by homogenizing the laser beam with a light tunnel (a transparent light passageway having flat internally reflective side surfaces). It has been determined that when the cross-section of the tunnel is a polygon (as preferred) and the sides of the tunnel are all parallel to the axis of the tunnel (as preferred), the laser light at the exit of the light tunnel (or alternatively at any image plane with respect thereto) will have a substantially uniform intensity distribution and will be incoherent only when the aspect ratio of the tunnel (length divided by width) equals or exceeds the contangent of the input beam divergence angle .theta. and whenW.sub.min =L.sub.coh (R+(1+R.sup.2).sup.1/2)>2RL.sub.coh,where W.sub.min is the minimum required width for the light tunnel, L.sub.

Abstract: An alignment system is described for lithographic proximity printing apparatus wherein the wafer and lithographic mask are each individually aligned with a third element. An alignment mask carries an alignment pattern corresponding to an alignment mark on the microcircuit wafer and also carries an alignment pattern corresponding to an alignment mark on the proximity printing mask. In one embodiment, the alignment mask is illuminated from the back side by alignment radiation (which need not be visible light) and the alignment patterns carried by the alignment mask are imaged onto the corresponding wafer and proximity printing mask alignment marks. Since the projected alignment patterns are spatially separated at the alignment mask one of the alignment patterns is conveniently shifted in effective optical position to compensate for the difference in axial position of the wafer and printing mask alignment marks. When a projected alignment pattern image correlates with (i.e.

Abstract: A display apparatus may be constructed by imparting motion to the light from a small light source to give the appearance of a line, causing the light to be "off" and "on" as desired during traverse of a line length, using as many light sources as needed for a two-dimensional display and precorrecting the light timing to compensate for the apparent change in movement rate during the motion.

Abstract: A dark field optical alignment apparatus is described for a projection exposure system wherein a tilted plane mirror (37) having at least one elliptical hole is positioned between a pattern mask (7) and a telecentric projection objective (45) to reflect diffracted light from alignment aids on a surface out of a main optical axis of the projection exposure system. Radiation is passed through alignment aid slits in the pattern mask and is transmitted through the elliptical hole in the plane mirror to illuminate corresponding edges (13, 15, 17) of the alignment aids on a wafer. Directly reflected light from the alignment aids is focused back through the elliptical hole by the telecentric objective. Diffracted light from the alignment aid edges is passed by the outer portion of the projection objective to the reflective surface of the plane mirror which reflects the radiation to a photo-detector that measures the intensity of the reflected radiation.

Abstract: A unit magnification optical system having micron resolution capability over a broad frequency spectrum. A spherical concave mirror is used to provide unit magnification at high numerical aperture with respect to object and image planes which are both located at or in the proximity of the center of curvature of the mirror, or the optical equivalent thereof. A first refractory element optically close to the object and image planes corrects longitudinal chromatic aberration of the principal rays while a second refractory element optically close to the mirror corrects residual longitudinal chromatic aberration of the marginal rays. In the preferred embodiment, a double prism arrangement located between the first refractory element and the center of curvature of the mirror optically reflects the object and image planes to parallel opposed positions having a common axis perpendicular to the axis of the mirror.