Abstract: An RF based, gridless plasma source comprising an RF coupler, an ionization chamber comprising a flow inlet, an upstream manifold, a flow exit, and a reasonably RF transparent gas containment tube that allows RF power to couple to the plasma inside the ionization chamber, and a choke restriction downstream; and a method of using the plasma source comprising a step of tailoring an energy distribution of extracted plasma.

Abstract: A plasma source comprising an RF coupling system, magnets or coils that generate magnetic fields, a gas injection system, and a vacuum tight RF transparent gas containment tube, wherein said RF coupling system comprises an RF coupler and said plasma source further comprises a choke point wherein the ratio of the field strength at said choke point to the field strength at said RF coupler is greater than two.