Abstract: Described herein is a combination film based on aluminium oxide (Al.sub.2 O.sub.3) and titanium oxide (TiO.sub.2), to be used in particular in the thin film electroluminescent structures. Aluminum oxide is an amorphous insulator having a low refraction index, whereas titanium oxide is a chrystalline conductor having a high refraction index. The combination film according to the invention comprises a plurality of alternating aluminium oxide and titanium oxide layers having a thickness of 3 to 1000 .ANG.. preferably 5 to 250 .ANG.. Such a combination film has favorable dielectric strength and refraction index properties and is particularly adapted for use in electroluminescence structures.

Abstract: Described herein is a thin film electroluminescence structure comprising a substrate layer (1), a first electrode layer (2), a second electrode layer (10) disposed at a distance from the first electrode layer (2), and a luminescence layer (6) disposed between the first (2) and the second electrode layer (10). Additional layer structures (3 to 5, 7 to 9) are disposed between the electrode layers (2 and 10) and the luminescence layer (6), said structures having current limiting and chemically protecting functions. The invention is based on the idea that it is possible to separate the functions of a chemical barrier and a current limitation from each other, whereby the production of the chemical protection in itself takes place without voltage losses, in other words, with a material whose electrical conductivity is essentially higher than the electrical conductivity of the current limiter.