Abstract: A method of forming an electronic fuse including forming a first metal line and a second metal line in a first interconnect level, the first metal line is electrically insulated from the second metal line, forming a single via in a second interconnect level above the first interconnect level, the via is made from the same material as either the first metal line or the second metal line, and the via is in direct contact with both the first metal line and the second metal line, a contact area between the via and the first metal line or the second metal line ranges from about 5% to about 25% of a total cross-sectional area of the via, the via has a height to width ratio greater than 1, and forming a third metal line in the second interconnect level in direct contact with the via.

Abstract: An method and structure of forming an electronic fuse. The method including forming a first metal line and a second metal line in a first interconnect level, wherein the first metal line is electrically insulated form the second metal line, and forming a via in a second interconnect level above the first interconnect level, the via electrically and physically connecting the first metal line with the second metal line. The via may create a sub-lithographic contact with the underlying metal line, thus increasing current density and probability of failure at a specific location.