Abstract: The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.

Abstract: A friction reducing pad system for sliding an appliance along a support surface includes a pad that is selectively positioned on a support surface. An appliance is selectively positioned on the pad. The pad facilitates the appliance to be slid along the support surface.