Patents by Inventor Jason H. Arjavac

Jason H. Arjavac has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9852750
    Abstract: An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: December 26, 2017
    Assignee: FEI Company
    Inventors: James P. Nadeau, Pei Zou, Jason H. Arjavac
  • Publication number: 20120199923
    Abstract: An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 9, 2012
    Applicant: FEI COMPANY
    Inventors: JAMES P. NADEAU, PEI ZOU, JASON H. ARJAVAC
  • Patent number: 8163145
    Abstract: An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: April 24, 2012
    Assignee: FEI Company
    Inventors: James P Nadeau, Pei Zou, Jason H. Arjavac
  • Publication number: 20100108506
    Abstract: An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.
    Type: Application
    Filed: October 28, 2009
    Publication date: May 6, 2010
    Applicant: FEI COMPANY
    Inventors: JAMES P. NADEAU, Pei Zou, Jason H. Arjavac
  • Patent number: 7611610
    Abstract: An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: November 3, 2009
    Assignee: Fei Company
    Inventors: James P. Nadeau, Pei Zou, Jason H. Arjavac