Abstract: A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

Abstract: A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

Abstract: Compositions including one or more fluorochemical surfactants of the formula: (I) where Rf is a perfluoroalkyl group, each of R1, R2 and R3 are C1-C20 alkyl, alkoxy, or aryl; and R4 is alkylene, arylene of a combination thereof. R4 is preferably an alkylene of 1-20 carbons that may be cyclic or acyclic, may optionally contain catenated or terminal heteroatoms selected from the group consisting of N, O, and S. Most preferably R4 is an alkylene of 2-10 carbon atoms. Described are anionic N-substituted fluorinated amine oxide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

Abstract: An ionic diol has formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms; R2 and R3 independently represent alkyl groups having from 1 to 4 carbon atoms; R4 represents an alkylene group having from 2 to 8 carbon atoms; and R5 represents an alkylene group having from 1 to 8 carbon atoms. Antistatic polymers are formed by copolymerization of monomers including a diisocyanate, an ionic diol, a polyether diol, and at least one non-ionic diols. Methods of making the antistatic polyurethanes are also disclosed.

Abstract: Antistatic polymers include divalent segments represented by the formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, and R4 represents an alkylene group having from 2 to 8 carbon atoms. Methods of making antistatic polymers are also disclosed.

Abstract: Antistatic polymers include divalent segments having the formulas (I) and (II) and wherein R1 represents an alkyl group having from 1 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, R4 represents an alkylene group having from 2 to 8 carbon atoms, and R5 independently represents H or methyl. Methods of making antistatic polymers are also disclosed.

Abstract: A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R1 and R2 is independently H or CH3, n is 1-3, and x is 1-3.

Abstract: Antistatic polymers include divalent segments having the formulas (I) and (II) and wherein R1 represents an alkyl group having from 1 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, R4 represents an alkylene group having from 2 to 8 carbon atoms, and R5 independently represents H or methyl. Methods of making antistatic polymers are also disclosed.

Abstract: Antistatic polymers include divalent segments represented by the formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, and R4 represents an alkylene group having from 2 to 8 carbon atoms. Methods of making antistatic polymers are also disclosed.

Abstract: An ionic diol has formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms; R2 and R3 independently represent alkyl groups having from 1 to 4 carbon atoms; R4 represents an alkylene group having from 2 to 8 carbon atoms; and R5 represents an alkylene group having from 1 to 8 carbon atoms. Antistatic polymers are formed by copolymerization of monomers including a diisocyanate, an ionic diol, a polyether diol, and at least one non-ionic diols. Methods of making the antistatic polyurethanes are also disclosed.

Abstract: A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R1 and R2 is independently H or CH3, n is 1-3, and x is 1-3.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—(CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: RfSO2N[CH2CH(CH3)OH]2;??(a) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6;??(b) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or??(c) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—(CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: RfSO2N[CH2CH(CH3)OH]2;??(a) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6;??(b) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or??(c) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—(CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) RfSO2N[CH2CH(CH3)OH]2; (b) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6; (c) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R? where Rf=CnF2n+1— and n=1 to 6, R?=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—(CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a)RfSO2N[CH2CH(CH3)OH]2; (b)RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6; (c)RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) Rf—SO2N[CH2CH(CH3)OH]2; (b) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6; (c) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) Rf—SO2N[CH2CH(CH3)OH]2; (b) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6; (c) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

Abstract: A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R? where Rf=CnF2n+1— and n=1 to 6, R?=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

Abstract: An lubricant composition comprising a C4 to C15 fluorooxirane fluid having a boiling point ?20° C., and a lubricant soluble or dispersible therein, is provided.