Patents by Inventor Jason M. Neidrich

Jason M. Neidrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7808449
    Abstract: Methods and apparatus for rendering plural channels on a common display are provided. In a method embodiment, a method for allowing sharing of a display by a plurality of users wishing to view a plurality of respective images includes displaying the plurality of respective images sequentially on the display. The method further includes selectively allowing the respective image to be viewed by the respective user, but not by any other of the plurality of users.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: October 5, 2010
    Assignee: Texas Instruments Incorporated
    Inventors: Jason M. Neidrich, Matthew G. Hine, Lisa A. Wesneski
  • Patent number: 7782389
    Abstract: A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.
    Type: Grant
    Filed: November 6, 2006
    Date of Patent: August 24, 2010
    Assignee: Texas Instruments Incorporated
    Inventor: Jason M. Neidrich
  • Patent number: 7576902
    Abstract: In accordance with the teachings of the present invention, a spatial light modulator mirror metal having enhanced reflectivity is provided. In a particular embodiment of the present invention, a light processing system includes a light source operable to provide a light beam along a light path and a spatial light modulator positioned in the light path, the spatial light modulator comprising an array of pixel elements, each pixel element comprising a deformable micro-mirror operable to reflect the light beam in at least one direction. At least a portion of each deformable micro-mirror comprises an Al—Cu alloy. A controller electrically connected to the spatial light modulator is operable to provide electrical signals to the spatial light modulator to cause the spatial light modulator to selectively deform the pixel elements, thereby selectively reflecting incident light beams along a projection light path.
    Type: Grant
    Filed: September 6, 2006
    Date of Patent: August 18, 2009
    Assignee: Texas Instruments Incorporated
    Inventors: Jason M. Neidrich, Lance W. Barron
  • Patent number: 7502155
    Abstract: According to one embodiment of the present invention, a semiconductor device includes a first layer of dielectric material disposed upon an upper surface of a substrate of a semiconductor device and a first non-conductive layer of metal disposed upon an upper surface of the dielectric material. The first layer of dielectric material and the first non-conductive layer of metal act as an optical trap for electromagnetic radiation received by the first non-conductive layer of metal. In particular embodiments, the semiconductor device may further comprise a second layer of dielectric material disposed upon an upper surface of the first non-conductive layer of metal and a second non-conductive layer of metal disposed upon an upper surface of the second layer of dielectric material.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: March 10, 2009
    Assignee: Texas Instruments Incorporated
    Inventors: Paul G. Sudak, Robert L. Adams, Jason M. Neidrich, Simon Joshua Jacobs, Lisa Ann Wesneski, Linda M. Wills, William D. Carter, Judith C. Frederic
  • Patent number: 7402880
    Abstract: According to one embodiment of the present invention, a semiconductor device includes a first layer of dielectric material disposed upon an upper surface of a substrate of the semiconductor device, a first layer of metal disposed upon an upper surface of the first layer of dielectric material, and a thick film anti-reflective layer having a thickness of at least about one micron disposed upon an upper surface of the first layer of metal.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: July 22, 2008
    Assignee: Texas Instruments Incorporated
    Inventor: Jason M. Neidrich
  • Publication number: 20080158095
    Abstract: Methods and apparatus for rendering plural channels on a common display are provided. In a method embodiment, a method for allowing sharing of a display by a plurality of users wishing to view a plurality of respective images includes displaying the plurality of respective images sequentially on the display. The method further includes selectively allowing the respective image to be viewed by the respective user, but not by any other of the plurality of users.
    Type: Application
    Filed: December 29, 2006
    Publication date: July 3, 2008
    Applicant: Texas Instruments Incorporated
    Inventors: Jason M. Neidrich, Matthew G. Hine, Lisa A. Wesneski
  • Patent number: 7365898
    Abstract: A method of tilting a micromirror includes forming a substrate, a micromirror outwardly from the substrate, and at least one electrode inwardly from the micromirror. The method further includes applying, by the at least one electrode, electrostatic forces sufficient to pivot the micromirror about a pivot point. In addition, the method includes providing the at least one electrode with a sloped outer surface. The sloped outer surface has a first end and a second end. The second end is closer to the pivot point than the first end, and the first end is closer to the substrate than the second end. The method also includes providing at least a portion of the at least one electrode with material properties that at least partially contribute to the sloped profile of the sloped outer surface.
    Type: Grant
    Filed: August 2, 2006
    Date of Patent: April 29, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Cuiling Gong, Larry J. Hornbeck, Jason M. Neidrich
  • Publication number: 20080055704
    Abstract: In accordance with the teachings of the present invention, a spatial light modulator mirror metal having enhanced reflectivity is provided. In a particular embodiment of the present invention, a light processing system includes a light source operable to provide a light beam along a light path and a spatial light modulator positioned in the light path, the spatial light modulator comprising an array of pixel elements, each pixel element comprising a deformable micro-mirror operable to reflect the light beam in at least one direction. At least a portion of each deformable micro-mirror comprises an Al—Cu alloy. A controller electrically connected to the spatial light modulator is operable to provide electrical signals to the spatial light modulator to cause the spatial light modulator to selectively deform the pixel elements, thereby selectively reflecting incident light beams along a projection light path.
    Type: Application
    Filed: September 6, 2006
    Publication date: March 6, 2008
    Inventors: Jason M. Neidrich, Lance W. Barron
  • Publication number: 20080030841
    Abstract: A method of tilting a micromirror includes forming a substrate, a micromirror outwardly from the substrate, and at least one electrode inwardly from the micromirror. The method further includes applying, by the at least one electrode, electrostatic forces sufficient to pivot the micromirror about a pivot point. In addition, the method includes providing the at least one electrode with a sloped outer surface. The sloped outer surface has a first end and a second end. The second end is closer to the pivot point than the first end, and the first end is closer to the substrate than the second end. The method also includes providing at least a portion of the at least one electrode with material properties that at least partially contribute to the sloped profile of the sloped outer surface.
    Type: Application
    Filed: August 2, 2006
    Publication date: February 7, 2008
    Inventors: Cuiling Gong, Larry J. Hornbeck, Jason M. Neidrich
  • Publication number: 20030045208
    Abstract: A chemical mechanical polishing includes a first spindle operable to rotate with respect to a central axis of the first spindle. A first polishing pad is coupled with the first spindle, and the first polishing pad has a first surface extending along a plane generally perpendicular to the central axis of the first spindle. A wafer carrier is included that is adapted to receive a wafer with a second surface generally parallel to the first surface of the first polishing pad. The wafer carrier is operable to rotate with respect to a central axis of the wafer carrier. The first surface of the first polishing pad is moveable along the central axis of the first spindle from a first position, wherein the first surface is spaced from the second surface, and a second position, wherein the first surface generally contacts the second surface.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 6, 2003
    Inventors: Jason M. Neidrich, Brian E. Zinn