Abstract: This disclosure provides systems, methods and apparatus for generating images using dual-shutter shutter assemblies. Such shutter assemblies include two shutters that move over a common aperture to selectively obstruct the passage of light there through. In the closed position, portions of one of the shutters overlaps a portion of the other shutter to provide such light obstruction without the two shutters needing to come into contact.

Abstract: This disclosure provides systems, methods and apparatus for forming display structures having shutters that have a different height than corresponding actuators. In one aspect, a display apparatus includes an electrostatic actuator including opposing beam electrodes having primary faces normal to a substrate on which they are formed. The height of at least one of the opposing beam electrodes defines an actuator height. The apparatus also includes a shutter configured to be driven by the electrostatic actuator. The shutter includes at least one protrusion, the protrusion having a first sidewall and a second sidewall normal to a primary plane of the shutter, wherein a first sidewall height of the first sidewall is substantially different from the actuator height.

Abstract: This disclosure provides systems, methods and apparatus for providing multi-level multi-state shutter assemblies. The shutter assembly includes at least a first shutter at a first height over a substrate and a second shutter at a second height over the substrate. Both the first shutter and the second shutter can be operated in an open or closed state for passing or partially blocking light propagating through an aperture. In some implementations, the shutter assembly can operate in four states: a fully transmissive state, a fully obstructive state and two partially transmissive states based on the open or closed states of the first and second shutters.

Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.

Abstract: A radio frequency (RF) excited laser assembly includes a pair of opposed electrodes defining an inter-electrode gap and a conductive termination bridge in electrical contact with both electrodes. The termination bridge mechanically supports and positions the electrodes relative to each other and provides a termination impedance for an RF voltage applied to the electrodes. A conical spiral inductor includes one or more metals windings, and one or more concentric terminals, such that the conical spiral inductor defines an inter-winding spacing sufficient to mitigate ionization of a gas medium between windings. A radio frequency (RF) feed-through assembly configured to apply an RF voltage to a pair of opposing electrodes such that a conductor is isolated from a metal sleeve position around the conductor by ion sheath discharge barrier.

Abstract: Display devices incorporating light modulators are disclosed along with methods of manufacturing such devices. According to some aspects of the invention, a control matrix for controlling light modulators of a display includes a light absorbing layer that includes a material having a substantially light absorbing property.

Abstract: Bridge structures provide a surface on which to form interconnections to components through through-hole vias. The bridge structures at least partially, and preferably fully, span the gap between two wafers, and, more specifically, between a through-hole via in one wafer and a corresponding component on the other wafer. Bridge structure may be formed on the wafer having the through-hole via and/or the wafer having the component.

Abstract: Bridge structures provide a surface on which to form interconnections to components through through-hole vias. The bridge structures at least partially, and preferably fully, span the gap between two wafers, and, more specifically, between a through-hole via in one wafer and a corresponding component on the other wafer. Bridge structure may be formed on the wafer having the through-hole via and/or the wafer having the component.

Abstract: A mixing machine consists of a hopper having a main chamber within its housing with a rotary member, a secondary chamber having a bottom worm conveying the material from one end of the mixing machine to the other end thereof, until collapsing with a loop found on its front portion and generating a material bubble; an upper worm to remove the material bubble and carrying it up to the middle part of the machine. At the middle part of the machine, the material is forced by a loop system having an upper worm to move towards the rotor area, such that the material is actually moving towards the back portion of the machine, completing a mixing cycle.

Abstract: A shadow mask material is selected so that the expansion characteristics of the shadow mask during thin film deposition closely match the expansion characteristics of the substrate. The shadow mask material is typically one with a low coefficient of thermal expansion (CTE). The shadow mask material must typically meet additional criteria, such as mechanical strength, feature quality, and dimensional accuracy criteria.

Abstract: A shadow mask material is selected so that the expansion characteristics of the shadow mask during thin film deposition closely match the expansion characteristics of the substrate. The shadow mask material is typically one with a low coefficient of thermal expansion (CTE). The shadow mask material must typically meet additional criteria, such as mechanical strength, feature quality, and dimensional accuracy criteria.