Abstract: A system for treating a substrate with an ozone-solvent solution has an ozone-solvent solution supply. The supply has a supply outlet, and the ozone solvent solution supply is capable of delivering at the supply outlet a generally continuous supply of an ozone-solvent solution formed at a first temperature. The system includes a heater having an inlet and heater outlet, with the inlet fluidly coupled to receive the ozone-solvent solution at approximately the first temperature from the supply outlet. The heater is configured to heat the ozone-solvent solution from the first temperature to a second temperature to form a heated ozone-solvent solution such that the heated ozone-solvent solution is supersaturated with ozone. The heater is capable of providing a generally continuous supply of heated, supersaturated, ozone-solvent solution at the heater outlet for use in treating the substrate.