Abstract: A plasma generator arrangement for applying material to an electrical conductive substrate and method for utilizing the same. The generator arrangement comprises a generator for creating and extending towards the substrate a plasma stream containing the material. The plasma generator arrangement further including structure for selectively controlling the electrical potential of the substrate relative to the generator anode so as to vary with time the extension of the plasma stream past the generator.

Abstract: A slidegate assembly is provided for use with a ladle wherein at least one of the slidegates has a recess countersunk about an opening in its surface in sliding engagement with the other slidegate, and has an insert made of a refractory material sprayed in the recess by a plasma gun device. The insert has an opening aligned with the opening in the slidegate, and is substantially coplanar with the sliding surface. In the closed position, the insert closes the opening of the other slidegate. The refractory material applied by the liquid stabilized plasma gun device provides an extremely hard insert that is highly resistant to the temperatures and erosive effects of various molten melts and to the abrasive effects caused by multiple shifts of the assembly during pouring operations. A method is provided for producing slidegates for the assembly.