Abstract: A maskless patterning apparatus allows for laser beam ablation of one or more layers of material while not etching an underlying different material layer. A micromirror array produces the desired complex pattern on the workpiece and a continuous feature and end point detection system provides location and material parameter changes to accurately control the pattern position and depth of etching. End point detection includes monitoring energy reflected from a specially prepared replica of the material to be ablated, whose thickness and consistency match the active workpiece area. The process terminates when the proper amount of material is removed.

Abstract: A programmable apparatus for laser beam shaping including a preprogrammable mircomirror array produces a spatial energy distribution suitable for accurately and rapidly marking, machining and processing materials. The preprogrammed micromirror array redistributes the laser output beam energy to produce a desired two-dimensional machining pattern on a work piece. The energy pattern created by the preprogrammed micromirror array is changeable between successive pulses of the laser to create accurate, complex three-dimensional machined shapes in a work piece not easily achieved by conventional machining systems. A special application of this invention is laser beam shaping to produce a uniform spatial energy distribution, i.e. homogenizing the beam from a laser with non-uniform energy distribution. Continuous adjustment of beam shaping is provided to maintain beam homogenization in accordance with changes in laser beam output energy profile.

Abstract: A laser machining device is capable of simultaneously machining two- or three dimentional patterns on the surface of a workpiece. A micromirror array positioned within a laser cavity generates a patterned plurality of laser beamlets which can be homogenized and deflected by a second micromirror array onto the surface of a workpiece to create a two-dimensional pattern. Alternatively, the second micromirror array can deflect laser beamlets of unequal energy density to produce a three-dimensional pattern.

Abstract: A method for making accurate and precise customized corrections to the surface of an optical lens is described. An electronic correction contour is generated from a measured refractive correction for a patient, and transferred to the surface of the lens by ablation etching with one or more laser pulses. After each of the laser pulses, the refractive properties of the lens are measured and compared to the electronic contour correction derived from a patient's refractive correction. The ablation etching is terminated in localized areas where the refractive properties match the electronic correction contour. End point detection includes monitoring refractive qualities of the lens during the recontouring process, modifying the pattern through changes in the laser pulses.

Abstract: A method for making accurate and precise customized corrections to the surface of an optical lens is described. An electronic correction contour is generated from a measured refractive correction for a patient, and transferred to the surface of the lens by ablation etching with one or more laser pulses. After each of the laser pulses, the refractive properties of the lens are measured and compared to the electronic contour correction derived from a patient's refractive correction. The ablation etching is terminated in localized areas where the refractive properties match the electronic correction contour. End point detection includes monitoring refractive qualities of the lens during the recontouring process, modifying the pattern through changes in the laser pulses.

Abstract: A programmable apparatus for laser beam shaping including a preprogrammable mircomirror array produces a spatial energy distribution suitable for accurately and rapidly marking, machining and processing materials. The preprogrammed micromirror array redistributes the laser output beam energy to produce a desired two-dimensional machining pattern on a work piece. The energy pattern created by the preprogrammed micromirror array is changeable between successive pulses of the laser to create accurate, complex three-dimensional machined shapes in a work piece not easily achieved by conventional machining systems. A special application of this invention is laser beam shaping to produce a uniform spatial energy distribution, i.e. homogenizing the beam from a laser with non-uniform energy distribution. Continuous adjustment of beam shaping is provided to maintain beam homogenization in accordance with changes in laser beam output energy profile.

Abstract: A laser machining device is capable of simultaneously machining two- or three dimentional patterns on the surface of a workpiece. A micromirror array positioned within a laser cavity generates a patterned plurality of laser beamlets which can be homogenized and deflected by a second micromirror array onto the surface of a workpiece to create a two-dimensional pattern. Alternatively, the second micromirror array can deflect laser beamlets of unequal energy density to produce a three-dimensional pattern.

Abstract: A maskless patterning apparatus allows for laser beam ablation of one or more layers of material while not etching an underlying different material layer. A micromirror array produces the desired complex pattern on the workpiece and a continuous feature and end point detection system provides location and material parameter changes to accurately control the pattern position and depth of etching. End point detection includes monitoring energy reflected from a specially prepared replica of the material to be ablated, whose thickness and consistency match the active workpiece area. The process terminates when the proper amount of material is removed.

Abstract: A playback stylus adapted for use in recovering information recorded in an information disc record which acts as a first conductive plate of a capacitor. The stylus includes a body of a first dielectric material having a first dielectric constant, a first layer of a second dielectric material having a dielectric constant less than the first dielectric constant overlaying the body, a second conductive layer overlaying the second dielectric material which acts as a second conductive plate of a capacitor, and a third layer of a dielectric material having a dielectric constant less than the first dielectric constant overlaying the conductive layer.