Patents by Inventor Jean Charles Cigal

Jean Charles Cigal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE
    Publication number: 20130276820
    Abstract: Methods and apparatus for the cleaning PECVD chambers that utilize molecular fluorine as the cleaning material.
    Type: Application
    Filed: August 10, 2011
    Publication date: October 24, 2013
    Inventors: Jean-Charles Cigal, Ying-Siang Hwang, Paul Alan Stockman, Richard Hogle, Stefan Petri
  • DEPOSITION CHAMBER CLEANING USING IN SITU ACTIVATION OF MOLECULAR FLUORINE
    Publication number: 20130239988
    Abstract: Methods and apparatus for the cleaning reaction chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the reaction chamber using the chamber RF power source.
    Type: Application
    Filed: August 18, 2011
    Publication date: September 19, 2013
    Inventors: Jean-Charles Cigal, Ying-siang Hwang, Paul Alan Stockman, Stefan Petri
  • REACTOR BOX CHAMBER CLEANING USING MOLECULAR FLUORINE
    Publication number: 20130220364
    Abstract: Methods and apparatus for the cleaning reactor box chambers using molecular fluorine as the cleaning material. The molecular fluorine is dissociated in-situ in the chamber using the chamber RF power source.
    Type: Application
    Filed: August 11, 2011
    Publication date: August 29, 2013
    Inventors: Jean-Charles Cigal, Stefan Petri, Paul Alan Stockman, Oliver Knieling
  • Method for Structuring a Layered Stack
    Publication number: 20100099253
    Abstract: One implementation is a method for fabricating a semiconductor on a substrate. A first layer is formed on the substrate. An implanted pattern is introduced into the first layer by implanting using a structured implantation mask arranged over the first layer. A structured second layer is formed on the first layer after removing the implantation mask. A first pattern is generated in the substrate using the second layer as a mask. The first layer is developed with regard to the implanted pattern. A second pattern is generated in the substrate using the first layer as a mask.
    Type: Application
    Filed: October 16, 2008
    Publication date: April 22, 2010
    Inventors: Ulrich Baier, Guenther Czech, Detlef Weber, Jean Charles Cigal, Michael Beck, Peter Lahnor, Marc Petri