Abstract: The color of an electrochromic stack in a tinted state may be modified to achieve a desired color target by utilizing various techniques alone or in combination. A first approach generally involves changing a coloration efficiency of a WOx electrochromic (EC) layer by lowering a sputter temperature to achieve a WOx microstructural change in the EC layer. A second approach generally involves utilizing a dopant (e.g., Mo, Nb, or V) to improve the neutrality of the tinted state of WOx (coloration efficiency changes). A third approach generally involves tailoring a thickness of the WOx layer to tune the color of the tinted stack.

Abstract: A laminated glass pane is described including a) a substrate glass, b) at least one layer structure applied to the substrate glass, c) at least one polymer layer applied to the layer structure, d) a cover glass on the polymer layer, wherein the mean coefficient of thermal expansion of the substrate glass is at most 18×10?7 K?1 greater than or at most 18×10?7 K?1 less than the mean coefficient of thermal expansion of the cover glass, and in the temperature range from ?40° C. to +90° C., the maximum mechanical stress of the laminated glass pane is less than or equal to 7 MPa. Uses of the laminated glass pane are also described.

Abstract: The present disclosure describes various processes of forming an electrochromic stack using at most one metallic lithium deposition station. In some aspects, a process may include depositing metallic lithium only within an electrochromic counter-electrode of an electrochromic stack. In some aspects, a process may include using a lithium-containing ceramic counter-electrode target to form an electrochromic counter-electrode and depositing metallic lithium only within or above an electrochromic electrode of the electrochromic stack. In some embodiments, a process may include using a lithium-containing ceramic electrode target, and optionally additionally depositing metallic lithium to add mobile lithium to the electrochromic stack. In some embodiments, a process may include using a single metallic lithium deposition station to deposit metallic lithium between an ion-conducting layer and an electrochromic electrode of the electrochromic stack.

Abstract: Various embodiments relate to an electrochromic (EC) device that is structured with surface contour features arranged according to a randomized pattern. For example, one or more conductive layers of an EC device may be structured with such surface ablations. In some embodiments, the randomized ablation pattern may comprise a randomized variation in one or more geometrical characteristics of a group of segments. In some examples, the geometrical characteristic(s) may include a distance characteristic, an orientation characteristic, and/or a shape characteristic, etc. According to various embodiments, the randomized ablation pattern may be configured to reduce diffraction and/or scatter of light incident on the surface ablations as compared to some other ablation patterns.

Abstract: An electrochromic structure can include a substrate and an electrochromic residue disposed on the substrate. The electrochromic structure can include an electrochromic stack on the substrate. A process can be used to separate the structure. The process can include forming a filament in the substrate and applying a thermal treatment to the substrate. Forming a filament can be performed by applying a pulse of laser energy to the substrate. In a particular embodiment, a filament pattern including a plurality of filaments can be formed in the substrate. The substrate can include mineral glass, sapphire, aluminum oxynitride, spinel, or a transparent polymer.

Abstract: A laminate can include a first panel and including a first transparent substrate having a first refractive index. The laminate can further include a second panel and a third panel, each coupled to the first panel. The second panel includes a second transparent substrate having a second refractive index, and the third panel includes a third transparent substrate having a third refractive index. The laminate can further include a fill material disposed within a gap between the second and third panels and having a fill material refractive index. The fill material refractive index is within 0.09 of the second refractive index, the third refractive index, or a value between the second and third refractive indices. Coupling may be direct or may be achieved with an adhesive film. The fill material can help to reduce the likelihood of seeing seams between the second and third panels.

Abstract: An assembly can include a first substrate, a second substrate, a non-light-emitting, variable transmission device deposited on the first substrate, and a transparent light-emitting device deposited on the second substrate, where the non-light-emitting, variable transmission device faces the transparent light-emitting device, and where the non-light emitting device alters an intensity of a wavelength prior to reaching the transparent light-emitting device.

Abstract: A glazing including an electrochromic component and a coating coupled to the electrochromic component. In an embodiment the coating includes a non-transparent element. In a further embodiment, the non-transparent element includes a plurality of non-transparent elements. In another aspect, a method of displaying an image includes providing an electrochromic component and a coating coupled to the electrochromic component and projecting the image onto the coating from a light emitting source.

Abstract: An electrochromic structure can include a substrate and an electrochromic residue disposed on the substrate. The electrochromic structure can include an electrochromic stack on the substrate. A process can be used to separate the structure. The process can include forming a filament in the substrate and applying a thermal treatment to the substrate. Forming a filament can be performed by applying a pulse of laser energy to the substrate. In a particular embodiment, a filament pattern including a plurality of filaments can be formed in the substrate. The substrate can include mineral glass, sapphire, aluminum oxynitride, spinel, or a transparent polymer.

Abstract: The invention relates to glazing (1) comprising a first glazing sheet (10; 10A, 10B) forming a substrate on which at least one film of an electrochemical system (12) is formed, said system having optical and/or energy-related properties that are electrically controllable, a second glazing sheet (14) forming a counter-substrate, and a third glazing sheet (18). The substrate has characteristics that allow it to be obtained by being cut from a motherboard on which motherboard at least one film or the electro-chemical system (12) is formed. The substrate is located between the counter-substrate (14) and the third glazing sheet (18) and is set back relative to the counter-substrate (14) and relative to the third glazing sheet (18) over the entire circumference of the substrate (10; 10A, 10B).

Abstract: Several of the films that comprise various energy producing or control devices, for example, electrochromic devices, lithium batteries, and photovoltaic cells, are sensitive to moisture in some way. They may be especially vulnerable to moisture at particular stages during their fabrication. It may also be highly desirable during fabrication to be able to wash particulates from the surface. The particulates may be generated some aspect of the fabrication process, or they may arise from the environment in which the fabrication takes place. This invention shows ways to remove said particles from the surface without incurring the damage associated with typical washing processes, resulting in higher manufacturing yields and better device performance.

Abstract: Several of the films that comprise various energy producing or control devices, for example, electrochromic devices, lithium batteries, and photovoltaic cells, are sensitive to moisture in some way. They may be especially vulnerable to moisture at particular stages during their fabrication. It may also be highly desirable during fabrication to be able to wash particulates from the surface. The particulates may be generated some aspect of the fabrication process, or they may arise from the environment in which the fabrication takes place. This invention shows ways to remove said particles from the surface without incurring the damage associated with typical washing processes, resulting in higher manufacturing yields and better device performance.

Abstract: A process for manufacturing an electrochromic glazing unit includes forming, on one face of a glass sheet, a complete all-solid-state electrochromic stack including in succession a first layer of a transparent conductive oxide; a layer of a cathodically colored mineral electrochromic material to form an electrochromic electrode; a layer of an ionically conductive mineral solid electrolyte; a layer of a cation intercalation material to form a counter electrode; and a second layer of a transparent conductive oxide; then heat treatment of the complete electrochromic stack by irradiation with radiation having a wavelength comprised between 500 and 2000 nm, the radiation originating from a radiating device placed facing the electrochromic stack, a relative movement being created between the radiating device and the substrate so as to raise the electrochromic stack to a temperature at least equal to 300° C. for a brief duration, for example shorter than 100 milliseconds.

Abstract: The invention relates to glazing (1) comprising a first glazing sheet (10; 10A, 10B) forming a substrate on which at least one film of an electrochemical system (12) is formed, said system having optical and/or energy-related properties that are electrically controllable, a second glazing sheet (14) forming a counter-substrate, and a third glazing sheet (18). The substrate has characteristics that allow it to be obtained by being cut from a motherboard on which motherboard at least one film of the electrochemical system (12) is formed. The substrate is located between the counter-substrate (14) and the third glazing sheet (18) and is set back relative to the counter-substrate (14) and relative to the third glazing sheet (18) over the entire circumference of the substrate (10; 10A, 10B).

Abstract: An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.

Abstract: A process for encapsulating an apparatus to restrict environmental element permeation between the apparatus and an external environment includes applying multiple barrier layers to the apparatus and preceding each layer application with a separate cleaning of the presently-exposed apparatus surface, resulting in an apparatus which includes an encapsulation stack, where the encapsulation stack includes a multi-layer stack of barrier layers. Each separate cleaning removes particles from the presently-exposed apparatus surface, exposing gaps in the barrier layer formed by the particles, and the subsequently-applied barrier layer at least partially fills the gaps, so that a permeation pathway through the encapsulation stack via gap spaces is restricted. The quantity of barrier layers applied to form the stack can be based on a determined probability that a stack of the particular quantity of barrier layers is independent of at least a certain quantity of continuous permeation pathways through the stack.

Abstract: An electrochemical device is disclosed. The electrochemical device includes a first transparent conductive layer, an electrochromic layer overlying the first transparent conductive layer, a counter electrode layer overlying the electrochromic layer, a second transparent conductive layer, and a switching speed parameter of not greater than 0.68 s/mm at 23° C.

Abstract: An apparatus can include an electrochromic device. When using the apparatus, the electrochromic device can be switched from a first transmission state to a continuously graded state and maintained at continuously graded transmission state. An apparatus can include an active stack with a first transparent conductive layer, a second transparent conductive layer, an anodic electrochemical layer between the first and the second transparent conductive layers, and a cathodic electrochemical layer between the first and the second transparent conductive layers. The apparatus can further include a first bus bar electrically coupled to the first transparent conductive layer, a second bus bar electrically coupled to the second transparent conductive layer, where the second bus bar is generally non-parallel to the first bus bar, and a third bus bar electrically coupled to the first transparent conductive layer, where the third bus bar is generally parallel to the first bus bar.

Abstract: An electrochromic device can include a substrate; an electrochromic layer or a counter electrode layer over the substrate and including a mobile ion; a first transparent conductive layer over the substrate and including Ag. In one embodiment, the electrochromic device can include a barrier layer disposed between first transparent conductive layer and the electrochromic or counter electrode layer. In another embodiment, the electrochromic device can include means for preventing (1) the mobile ion from migrating into the first transparent conductive layer, (2) Ag from migrating into the electrochromic layer or counter electrode layer, or both (1) and (2). A process of forming an electrochromic device can include forming an electrochromic layer or a counter electrode layer over a substrate; forming a barrier layer; and forming a first transparent conductive layer over the substrate.

Abstract: An electrochromic device can include a substrate; an electrochromic layer or a counter electrode layer over the substrate and including a mobile ion; a first transparent conductive layer over the substrate and including Ag. In one embodiment, the electrochromic device can include a barrier layer disposed between first transparent conductive layer and the electrochromic or counter electrode layer. In another embodiment, the electrochromic device can include means for preventing (1) the mobile ion from migrating into the first transparent conductive layer, (2) Ag from migrating into the electrochromic layer or counter electrode layer, or both (1) and (2). A process of forming an electrochromic device can include forming an electrochromic layer or a counter electrode layer over a substrate; forming a barrier layer; and forming a first transparent conductive layer over the substrate.