Patents by Inventor Jean-Luc Birbaum
Jean-Luc Birbaum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070248782Abstract: The invention relates to an optical recording medium comprising a substrate, a reflecting layer and a recording layer, wherein the recording layer comprises a compound of formula preferably a compound of formula or a mesomeric or tautomeric form thereof, wherein Ah+ is an organic cation having h quaternary ammonium or phosphonium groups; Q1 is N or CR15, Q2 is N or CR16, Q3, Q5 and Q7 are each independently of the other CR17R18, O, S or NR19, Q4 is CR13 or N and Q6 is CR14 or N; and one of R1 and R3 is OR17, OR20, SR17, SR20, NR17R18, NR18R20 or NR20R21, and the other of R1 and R3 is O?, S? or N?R22. The compounds of formula (I) and (II) are novel and also claimed, as well as mixtures thereof with metal complexes. The optical recording media are remarkably suitable for DVD±R (658 nm), especially at high recording speeds.Type: ApplicationFiled: July 6, 2005Publication date: October 25, 2007Inventors: Jean-Pierre Bacher, Gisele Baudin, Frederique Wendeborn, Jean-Marie Adam, Urs Lehmann, Jean-Luc Birbaum
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Publication number: 20070225395Abstract: Disclosed are cationic photocurable compositions with improved shelf life stability. The thermally stable compositions comprise at least one cationically polymerizable compound, for example an epoxy compound, at least one onium salt photoinitiator and at least one compound selected from the group consisting of the organic phosphorus stabilizers and the hindered nitroxyl stabilizers. Also disclosed is a cationic photoinitiator composition comprising at least one onium salt photoinitiator and at least one compound selected from the group consisting of the organic phosphorus stabilizers and the hindered nitroxyl stabilizers.Type: ApplicationFiled: May 14, 2007Publication date: September 27, 2007Inventors: Jean-Pierre Wolf, Stephen Ilg, Jean-Luc Birbaum, Eugene Sitzman, David Bramer, Greg Losapio
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Publication number: 20060270748Abstract: The Invention relates to novel ketones of formulae (I) and (II) wherein R1, R2, R3 and R4 are, for example, C1-C8alkyl, R5 is, for example, hydrogen, A is CI, Br, -0-R7, —NR8R9 or —S—R16, A? is —O—, —NH— or —NR8—, X and Y are each independently of the other —O—R10 or —N(R11)(R12), n is an integer from 1 to 10, R6 is, for example, an n-valent radical of linear or branched C2-C20alkyl the carbon chain of which may be interrupted by cyclohexanediyl, phenylene, —CH(OH)—, —C(C2H5)(CH2—CH2—OH)—, —C(CH3)(CH2—CH2—OH)—, —C(CH2—CH2—OH)2—, —N(CH3)—, —N(C2H5)—, —N(CH2—CH2—OH)—, —CO—O—, —O—CO—, —P(CH2—CH2—OH)—, —P(O)(CH2—CH2—OH)—, -0-P(O—CH2—CH2—OH)—O—, -0-P(O)(0-CH2—CH2—OH)—O—, —O-cyclohexanediyl-C(CH3)2-Cyclohexanediyl-O—, —O-phenylene-C(CH3)2-phenylene-O—, —O-phenylene-CH2-phenylene-O—, —Si(CH3)2—, -0-Si(CH3)2—O—, —O—Si(CH3)(0-CH3)—O—, —Si(CH3)(R17)—O—Si(CH3)(R18)—, 5-(2-hydroxyethyl)-[1,3,5]triazinane-2,4,6-trione-1,3-diyl and/or by from one to nine oxygen atoms.Type: ApplicationFiled: May 4, 2004Publication date: November 30, 2006Inventors: Reinhard Sommerlade, Rinaldo Husler, Stephen Ilg, Andre Fuchs, Souad Boulmaaz, Jean-Luc Birbaum
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Patent number: 6949678Abstract: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a.Type: GrantFiled: December 12, 2000Date of Patent: September 27, 2005Assignee: Ciba Specialty Chemicals Corp.Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
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Publication number: 20050191567Abstract: Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a.Type: ApplicationFiled: April 11, 2005Publication date: September 1, 2005Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
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Publication number: 20050165141Abstract: Disclosed are cationic photocurable compositions with improved shelf life stability. The thermally stable compositions comprise at least one cationically polymerizable compound, for example an epoxy compound, at least one onium salt photoinitiator and at least one compound selected from the group consisting of the organic phosphorus stabilizers and the hindered nitroxyl stabilizers. Also disclosed is a cationic photoinitiator composition comprising at least one onium salt photoinitiator and at least one compound selected from the group consisting of the organic phosphorus stabilizers and the hindered nitroxyl stabilizers.Type: ApplicationFiled: January 21, 2005Publication date: July 28, 2005Inventors: Jean-Pierre Wolf, Stephen Ilg, Jean-Luc Birbaum, Eugene Sitzman, David Bramer, Greg Losapio
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Patent number: 6706215Abstract: Coatings comprising A) a binder based on an organic polymer and B) as stabilizer against damage by light, heat and oxygen, a 2-(2′-hydroxyphenyl)-1,3-pyrimidine of the formula I in which the radicals R1 to R6 are as defined in claim 1 have an outstanding resistance to the damaging effects of light, oxygen and heat. Compounds of the formula Ib defined in claim 18 are suitable in general for the stabilization of organic material.Type: GrantFiled: June 23, 1997Date of Patent: March 16, 2004Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Valet, Jean-Luc Birbaum, Gerhard Rytz, Norbert Wüms
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Patent number: 6703182Abstract: Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 andType: GrantFiled: February 15, 2001Date of Patent: March 9, 2004Assignee: Ciba Specialty Chemicals CorporationInventors: Jean-Luc Birbaum, Toshikage Asakura, Hitoshi Yamato
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Publication number: 20030225192Abstract: o-Hydroxyphenyl-s-triazines of the formula I 1Type: ApplicationFiled: June 3, 2003Publication date: December 4, 2003Inventors: Jean-Luc Birbaum, Jean Rody, Mario Slongo, Andreas Valet, Roland A.E. Winter
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Patent number: 6608122Abstract: o-Hydroxyphenyl-s-triazines of the formula I in which n is 1 to 4 and R1 to R7 are as defined in claim 1, can be used, in combination with sterically hindered amines of the polyalkylpiperidine type, for stabilizing organic polymers. Some of these compounds are novel and can also be used without polyalkylpiperidine.Type: GrantFiled: October 5, 2000Date of Patent: August 19, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Jean-Luc Birbaum, Jean Rody, Mario Slongo, Andreas Valet, Roland A. E. Winter
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Patent number: 6596445Abstract: Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, CType: GrantFiled: June 23, 1999Date of Patent: July 22, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Akira Matsumoto, Hidetaka Oka, Masaki Ohwa, Hisatoshi Kura, Jean-Luc Birbaum, Kurt Dietliker
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Patent number: 6512020Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.Type: GrantFiled: March 28, 2001Date of Patent: January 28, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
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Patent number: 6485886Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.Type: GrantFiled: April 24, 2001Date of Patent: November 26, 2002Assignee: Ciba Specialty Chemicals CorporationInventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
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Publication number: 20010036591Abstract: Radiation-sensitive compositions comprisingType: ApplicationFiled: December 18, 2000Publication date: November 1, 2001Inventors: Reinhard Schulz, Jean-Luc Birbaum, Jean-Pierre Wolf, Stephan Ilg, Hitoshi Yamato, Toshikage Asakura
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Patent number: 6306555Abstract: Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with theType: GrantFiled: December 18, 2000Date of Patent: October 23, 2001Assignee: CIBA Specialty Chemicals Corp.Inventors: Reinhard Schulz, Jean-Luc Birbaum, Jean-Pierre Wolf, Stephan Ilg, Hitoshi Yamato, Toshikage Asakura
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Publication number: 20010012596Abstract: Compounds of the formulae I, II, III, IV and V 1Type: ApplicationFiled: December 12, 2000Publication date: August 9, 2001Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
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Patent number: 6261738Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.Type: GrantFiled: March 23, 2000Date of Patent: July 17, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
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Patent number: 6187919Abstract: o-Hydroxyphenyl-s-triazines of the formula I in which n is 1 to 4 and R1 to R7 are as defined in claim 1, can be used, in combination with sterically hindered amines of the polyalkylpiperidine type, for stabilizing organic polymers. Some of these compounds ate novel and can also be used without polyalkylpiperidine.Type: GrantFiled: January 19, 1996Date of Patent: February 13, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Jean-Luc Birbaum, Jean Rody, Mario Slongo, Andreas Valet, Roland A. E. Winter
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Patent number: 6057380Abstract: Compounds of formula I, II or III ##STR1## X is a divalent radical; Y is C.sub.1 -C.sub.6 aklylene, cyclohexylene or a direct bond;Ar.sub.1 is an aromatic radical as defined in claim 1,R.sub.1 and R.sub.2 are each independently the other, inter alia, a radical of formula ##STR2## in which p is zero or 1, or a radical of formula ##STR3## R.sub.3 is, inter alia, hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.3 alkyl;R.sub.4 is, inter alia, C.sub.1 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.3 alkyl or phenyl;or an acid addition salt of a compound of formula I, II or III;are useful as photosensitive base catalysts in base crosslinking compositions.Type: GrantFiled: December 5, 1997Date of Patent: May 2, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Jean-Luc Birbaum, Martin Kunz, Akira Kimura, Hisatoshi Kura, Hidetaka Oka, Hiroko Nakashima
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Patent number: 6022906Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.Type: GrantFiled: December 1, 1997Date of Patent: February 8, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka