Patents by Inventor Jean-Luc Tissot

Jean-Luc Tissot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7692146
    Abstract: This detector comprises an assembly of elementary sensors capable of detecting said radiation. This assembly comprises at least two separate detection areas, a first detection area comprising elementary sensors having a first thermal time constant and a second detection area comprising elementary sensors having a second thermal time constant which is different to said first thermal time constant.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: April 6, 2010
    Assignee: ULIS
    Inventor: Jean-Luc Tissot
  • Publication number: 20080048119
    Abstract: This detector comprises an assembly of elementary sensors capable of detecting said radiation. This assembly comprises at least two separate detection areas, a first detection area comprising elementary sensors having a first thermal time constant and a second detection area comprising elementary sensors having a second thermal time constant which is different to said first thermal time constant.
    Type: Application
    Filed: July 23, 2007
    Publication date: February 28, 2008
    Applicant: ULIS
    Inventor: JEAN-LUC TISSOT
  • Patent number: 5119240
    Abstract: An assembly of parts forming an angle between facing surfaces of the parts and a process for producing an assembly is described. The parts (2, 4) are provided with contact elements or pads (6, 8, 10, 12) for connection to one another by means of a relatively low melting point metallic soldering material. The surface of each of the pads is wettable by the low melting point metallic material in the molten state, while areas surrounding the pads are not wettable. The contact pads of one of the parts are covered with flat coils or wafers (10, 12) of the low melting point metallic material. The wafers have the same thickness, but different volumes. The contact pads of the other part are placed on the corresponding wafers. The wafers' thickness, volumes, and spacing are chosen so that when the wafers are heated to the molten state and form truncated spherical drops due to surface tension, the parts form between them a predetermined angle. The invention has particular application to the manufacture of mirrors.
    Type: Grant
    Filed: August 8, 1990
    Date of Patent: June 2, 1992
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Francois Marion, Michel Ravetto, Jean-Luc Tissot